2020
DOI: 10.3390/mi11110995
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Advanced Top-Down Fabrication for a Fused Silica Nanofluidic Device

Abstract: Nanofluidics have recently attracted significant attention with regard to the development of new functionalities and applications, and producing new functional devices utilizing nanofluidics will require the fabrication of nanochannels. Fused silica nanofluidic devices fabricated by top-down methods are a promising approach to realizing this goal. Our group previously demonstrated the analysis of a living single cell using such a device, incorporating nanochannels having different sizes (102–103 nm) and with b… Show more

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Cited by 37 publications
(31 citation statements)
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“…Microchip 1 having a microchannel (depth, 30 ± 1.5 m; width, 1000 ± 50 m; outer circumference, 2060 ± 70 m; cross-sectional area, 3.0 ± 0.2 × 10 4 m 2 ) was fabricated via photolithography and dry etching, as described in previous studies. 21,22 A quartz glass substrate (size, 30 × 70 mm; thickness, 0.7 mm; VIOSIL-SX, Shin-Etsu Quartz Co., Ltd., Tokyo, Japan) was used. The glass substrate was sputtered with Cr to a thickness of 50 µm.…”
Section: Microchip Fabricationmentioning
confidence: 99%
“…Microchip 1 having a microchannel (depth, 30 ± 1.5 m; width, 1000 ± 50 m; outer circumference, 2060 ± 70 m; cross-sectional area, 3.0 ± 0.2 × 10 4 m 2 ) was fabricated via photolithography and dry etching, as described in previous studies. 21,22 A quartz glass substrate (size, 30 × 70 mm; thickness, 0.7 mm; VIOSIL-SX, Shin-Etsu Quartz Co., Ltd., Tokyo, Japan) was used. The glass substrate was sputtered with Cr to a thickness of 50 µm.…”
Section: Microchip Fabricationmentioning
confidence: 99%
“…Microchannels and nanochannels were fabricated on glass substrates (VIO-SILSX, Shin-Etsu Quartz Co., Ltd., Tokyo, Japan) by photolithography and electron beam lithography followed by reactive ion etching. 28 After modifying all the nanochannels with hydrophobic molecules (octadecyltrimethoxysilane, ODS), the modification on one half of the side of the nanochannel was removed by irradiating with a FIB (Fig. 1).…”
Section: Fabrication Processmentioning
confidence: 99%
“…[22][23][24][25][26][27] Our group has been exploiting this field utilizing 10-1000 nm sized nanochannels on a glass substrate. 28 Based on the high surface area effect in such a small volume, novel unit operations at the molecular level such as single-molecule ELISA (enzyme-linked immunosorbent assay), 29 single DNA molecule sorting, 30 nano-chromatography using the channel as a separation column, 31 and picoliter enzyme reactors 32 have been performed. These operations are called nano unit operations (NUOs) and in order to interconnect NUOs and realize integrated nanofluidic analytical systems, formation of parallel multiphase flows in nanochannels is required.…”
Section: Introductionmentioning
confidence: 99%
“…Contamination during nanochannel fabrication processes is no exception. Electron beam (EB) lithography, photolithography, and dry etching are the main processes we employ for the fabrication of fused silica nanochannels/microchannels [ 33 ]. In these processes, different etching masks are used based on the target channel dimensions.…”
Section: Introductionmentioning
confidence: 99%