Advanced process control by machine learning-based virtual metrology for high product mix manufacturing
Hyung Joo Lee,
Sanghyun Choi,
Nathan G. Greeneltch
et al.
Abstract:The semiconductor foundry industry struggles with challenges in high-product-mix manufacturing, necessitating enhanced flexibility to address diverse customer demands. Coordinating multiple chambers and process steps with varying designs and technology nodes poses complexities leading to reduced yields and increased costs. The chemical vapor deposition (CVD) process introduces thickness variations due to device layout design and chamber condition drift, impacting transistor parameters and yield. Managing chamb… Show more
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