2013
DOI: 10.1002/ceat.201200336
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Advanced Oxidative Removal of Nitric Oxide from Flue Gas by Homogeneous Photo‐Fenton in a Photochemical Reactor

Abstract: In this work, advanced oxidation removal of nitric oxide (NO) from flue gas by homogeneous Photo-Fenton was investigated in a photochemical reactor and the effects of several influencing factors on NO removal were evaluated. The gasliquid reaction products were determined. The reaction pathways of NO removal are also preliminarily discussed. It was found that with the increase of Fe 2+ concentration, NO removal efficiency first increased and then decreased. Increasing H 2 O 2 concentration and UV radiation int… Show more

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Cited by 16 publications
(13 citation statements)
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“…This phenomenon may be explained by the several reasons as follows. Related results indicate that H 2 O 2 in alkaline (9) and (10) [1,[23][24][25].…”
Section: Resultsmentioning
confidence: 93%
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“…This phenomenon may be explained by the several reasons as follows. Related results indicate that H 2 O 2 in alkaline (9) and (10) [1,[23][24][25].…”
Section: Resultsmentioning
confidence: 93%
“…In addition, related results show that increasing Fe 3+ or Cu 2+ concentration will increase the yield of Å OH produced by Fentonlike reagents by the following reactions (3)-(8) [17][18][19][20][21][22]24,25].…”
Section: Resultsmentioning
confidence: 95%
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