2013
DOI: 10.15866/ireche.v5i2.6909
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Advanced Oxidative Degradation Processes: Fundamentals and Applications

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Cited by 44 publications
(43 citation statements)
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“…The hydroxyl ion is very significant due to its high oxidation power and the reduction in environmental pollution caused by organic matter [21,22]. This method is applicable to the degradation of resistant compounds in comparison to other methods and, in view of its high oxidizing power; it converts them into mineral forms under special conditions [23]. In addition, recent advances on the removal of dyes using Fe-based metallic glasses/AOPs are also attractive [24][25][26].…”
Section: Introductionmentioning
confidence: 99%
“…The hydroxyl ion is very significant due to its high oxidation power and the reduction in environmental pollution caused by organic matter [21,22]. This method is applicable to the degradation of resistant compounds in comparison to other methods and, in view of its high oxidizing power; it converts them into mineral forms under special conditions [23]. In addition, recent advances on the removal of dyes using Fe-based metallic glasses/AOPs are also attractive [24][25][26].…”
Section: Introductionmentioning
confidence: 99%
“…Increasing chloride concentration deriving from gold precursor consumption can lead to the formation of various transition metal complexes absorbing in this region. In particular, at pH = 3.5 the most abundant complexes are FeOH 2+ , Fe(OH) 2 + and CrOH 2+ , Cr 3 (OH) 4 5+ [42][43][44]. Consequently, this additional contribution cannot be separated from that of the gold precursor.…”
Section: Effect Of the Stainless Steel Compositionmentioning
confidence: 98%
“…Hydroxyl radical (OH  ) is known to have a higher oxidation potential (2.85 eV) than other widely used oxidants such as hydrogen peroxide (1.77 eV), ozone (2.07 eV) [10], atomic oxygen (2.42 eV) and chlorine (1.6 eV) [11]. OH  radicals are non-selective and their reactivity with most organic contaminants is higher than that of other oxidizing agents.…”
Section: Introductionmentioning
confidence: 99%