2021
DOI: 10.1016/j.cej.2020.128207
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Advanced oxidation processes for water disinfection: Features, mechanisms and prospects

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Cited by 189 publications
(70 citation statements)
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“…Besides chlorination, ozonation is another common sewage disinfection technology. Ozone (O 3 ) is a powerful oxidant that acts against a variety of microorganisms. It does, however, produce DBPs during water disinfection. , The inactivation mechanism of ozonation for bacteria mainly involves O 3 attacking the cell wall and causing its cleavage.…”
Section: Advances In Water Disinfection Technologies In Removing Arb ...mentioning
confidence: 99%
“…Besides chlorination, ozonation is another common sewage disinfection technology. Ozone (O 3 ) is a powerful oxidant that acts against a variety of microorganisms. It does, however, produce DBPs during water disinfection. , The inactivation mechanism of ozonation for bacteria mainly involves O 3 attacking the cell wall and causing its cleavage.…”
Section: Advances In Water Disinfection Technologies In Removing Arb ...mentioning
confidence: 99%
“…In addition to SO 4 · – and HO · , · O 2 – may participate in the catalytic process. The CMs could activate PMS to produce · O 2 – by eqs – for the degradation of organic pollutants . The production of · O 2 – by the activation of PDS has a similar electronic conduction mechanism but with a distinct pathway (eqs and )).…”
Section: Mechanistic Understanding Of the Cms/ps Systemmentioning
confidence: 99%
“…Concerns surrounding these bacteria are fairly high, because several studies have revealed that they are usually present in wastewater treatment plants [7,8]. Therefore, the development of alternative water disinfection methods such as advanced oxidation process (AOP) has a huge interest [9,10]. AOPs are characterised by the in-situ generation of reactive oxygen species (ROS), especially superoxide anion (•O 2 − ) and hydroxyl radicals (•OH) which act as powerful oxidising agents capable of decomposing various organic compounds [2].…”
Section: Introductionmentioning
confidence: 99%