Advanced multilayer Laue lens fabrication at NSLS-II

Conley, Ray; Bouet, Nathalie; Zhou, Juan; Yan, Hongyuan; Chu, Yong S.; Lauer, Kenneth; Miller, J C; Chu, Luke; Jahedi, Nima

doi:10.1117/12.930216

Cited by 10 publications

(5 citation statements)

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“…1c shows that 12 marker layers were deposited within the multilayer structure. Comparison of the actual marker layer positions against the ideal positions provides an effective method to quantify the accuracy of zone placements 23 . Using this method, we determined, with a precision better than 1 nm, that the MLL zone placement error is ±2 nm over the 43.4 μ m aperture.…”

Section: Resultsmentioning

confidence: 99%

11 nm hard X-ray focus from a large-aperture multilayer Laue lens

Huang

Yan

Nazaretski

et al. 2013

Sci Rep

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137

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The focusing performance of a multilayer Laue lens (MLL) with 43.4 μm aperture, 4 nm finest zone width and 4.2 mm focal length at 12 keV was characterized with X-rays using ptychography method. The reconstructed probe shows a full-width-at-half-maximum (FWHM) peak size of 11.2 nm. The obtained X-ray wavefront shows excellent agreement with the dynamical calculations, exhibiting aberrations less than 0.3 wave period, which ensures the MLL capable of producing a diffraction-limited focus while offering a sufficient working distance. This achievement opens up opportunities of incorporating a variety of in-situ experiments into ultra high-resolution X-ray microscopy studies.

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Section: Resultsmentioning

confidence: 99%

11 nm hard X-ray focus from a large-aperture multilayer Laue lens

Huang

Yan

Nazaretski

et al. 2013

Sci Rep

Self Cite

137

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“…The discovery of bulk defects within MLLs when deposition thicknesses reached the 40 m range led to work on reactive deposition 59 with N 2 . This significantly reduced accumulated film stress in several 60 material systems.…”

Section: Large Aperture Mll Optics Reaching the 100 M Markmentioning

confidence: 99%

Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Bouet

Macrander

Mäser

et al. 2019

j nanosci nanotechnol

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Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 m range, to real beamline-deployed optics with apertures in the 40-50 m range (X. Huang, et al., Scientific

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“…While flat and wedged MLLs share a lot of common features, wedged MLLs are more complex optics to manufacture due to the additional grading requirement [9]. Usually, after the multilayers have been deposited, flat and wedged MLLs are fabricated by sectioning multilayer films into 5 to 20 µm thick slivers [4,6,[9][10][11][12]. The high aspect ratio (section depth to zone width) structure of MLLs poses considerable challenges for lens fabrication, especially for large aperture sizes [13].…”

Section: Introductionmentioning

confidence: 99%

“…Because MLLs consist of thousands of layers, lateral mechanical fracture is easy to occur along layer-to-layer interfaces [14]. Thick multilayer films are potentially highly stressed, and with increasing film thickness, residual stress in an MLL increases [4,8,10,15]. During the sectioning and polishing process, high stress can frequently result in defects like fracture, bending, or delamination in the finished lens.…”

Section: Introductionmentioning

confidence: 99%

Development of mechanical polishing methods for multilayer Laue lens fabrication

Zhou,

Yan,

Conley

et al. 2023

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX

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Multilayer Laue lenses (MLLs) are diffractive optics to achieve nanometer-scale hard x-ray focusing. Flat and wedged MLLs are fabricated by sectioning multilayer films made of thousands of planar or laterally graded and depth-graded layers. The total thickness of the films could extend to over 100 micrometers. The outmost zone width of an MLL is one to a few nanometers. After the deposition of multilayers, the films are sectioned to an appropriate thickness targeting the optimal focusing efficiency over the operating x-ray energy range. Wedged MLLs are candidates to achieve higher efficiency and sub-10 nm hard x-ray focusing, which are more complex optics to produce. In particular, wedged MLL fabrication brings additional critical requirements on section(s) extraction. At the National Synchrotron Light Source II (NSLSII) of Brookhaven National Laboratory (BNL), we made evolutions in MLL fabrication by mechanical polishing methods over the last decade. We started with conventional polishing and then developed the polish-on-diamond and the combined polishing with focused ion beam (FIB) methods. The introduction of new techniques has proven effective in improving our MLL fabrication efficiency. In this paper, the current progress of each method is discussed in detail.

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Advanced multilayer Laue lens fabrication at NSLS-II

Cited by 10 publications

References 0 publications

11 nm hard X-ray focus from a large-aperture multilayer Laue lens

11 nm hard X-ray focus from a large-aperture multilayer Laue lens

Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Development of mechanical polishing methods for multilayer Laue lens fabrication

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