Advanced gate stack work function optimization and substrate dependent strain interactions on HKMG first stacks for 28nm VLSI ultra low power technologies

Hoentschel, J.; Ong, Shao Jin; Balzer, T.; Sassiat, Nicolas; Yan, Ran; Herrmann, T.; Flachowsky, S.; Grass, C.; Beyer, Sven; Kallensee, O.; Lin, Yu-Yin; Shickova, A.; Muehlhoff, A.; Kretzschmar, Claudia; Winkler, J.; Wiatr, Maciej; Horstmann, Μ.

doi:10.1109/ulis.2013.6523485

2013 14th International Conference on Ultimate Integration on Silicon (ULIS) 2013

DOI: 10.1109/ulis.2013.6523485

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Advanced gate stack work function optimization and substrate dependent strain interactions on HKMG first stacks for 28nm VLSI ultra low power technologies

J. Hoentschel

Shao Jin Ong

T. Balzer

et al.

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Advanced gate stack work function optimization and substrate dependent strain interactions on HKMG first stacks for 28nm VLSI ultra low power technologies

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