Advance Chemical Mechanical Polishing Technique for Gallium Nitride Substrate
Xuanyi Zhao,
Shouzhi Wang,
Lei Liu
et al.
Abstract:As the representative of substrate material, gallium nitride (GaN) has excellent mechanical properties and high thermal stability. Achieving high surface flatness is critical for subsequent epitaxial growth and device fabrication processes. Chemical mechanical polishing (CMP) technique of GaN is commonly one of the most effective ways to achieve atomically smooth surfaces. However, the current process is difficult to meet the needs of industrial development due to the characteristics of low material removal ra… Show more
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