2017
DOI: 10.1016/j.bbrep.2017.01.007
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Adult human dermal fibroblasts exposed to nanosecond electrical pulses exhibit genetic biomarkers of mechanical stress

Abstract: BackgroundExposure of cells to very short (<1 µs) electric pulses in the megavolt/meter range have been shown to cause a multitude of effects, both physical and molecular in nature. Physically, nanosecond electrical pulses (nsEP) can cause disruption of the plasma membrane, cellular swelling, shrinking and blebbing. Molecularly, nsEP have been shown to activate signaling pathways, produce oxidative stress, stimulate hormone secretion and induce both apoptotic and necrotic death. We hypothesize that studying th… Show more

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Cited by 5 publications
(10 citation statements)
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“…The results of our experiments did not show any significant change in the expression of Caspase‐4 post‐exposure to nsPEFs at the tested parameters. These results mirror the microarray analysis provided by Roth et al []. Interestingly, no significant increase in Caspase‐4 expression was observed post‐exposure to TM, a drug known to induce ER stress.…”
Section: Resultssupporting
confidence: 88%
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“…The results of our experiments did not show any significant change in the expression of Caspase‐4 post‐exposure to nsPEFs at the tested parameters. These results mirror the microarray analysis provided by Roth et al []. Interestingly, no significant increase in Caspase‐4 expression was observed post‐exposure to TM, a drug known to induce ER stress.…”
Section: Resultssupporting
confidence: 88%
“…In short, a custom Blumlein line pulser composed of two parallel plates connected via spark gap chamber pressurized with Sulfur Hexafluoride (SF 6 ) gas was used to deliver the 10-ns PEF to a metal-walled cuvette containing cells. To better correlate our results with previously observed microarray results [Kolb et al, 2006;Roth et al, 2017], cell exposure parameters were mirrored: 100, 150 kV/cm 10-ns pulses at a repetition rate of 1 Hz. Each nsPEF waveform was acquired using a high-speed oscilloscope (TDS3052B, Tektronix, Wilsonville, OR) ( Fig.…”
Section: Cell Culture and Nspef Exposurementioning
confidence: 80%
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