We
measured the molar Peltier heat during the course of Cu underpotential
deposition (UPD) in sulfate-containing solutions by electrochemical
microcalorimetry. The molar Peltier heat during Cu UPD deviates considerably
from that of Cu bulk deposition in the corresponding solution. Since
the molar Peltier heat directly reflects the reaction entropy of the
involved electrochemical reaction, including also charge-neutral side
processes, this finding signals significant contributions of non-Faradaic
side reactions. For the first stage of the Cu UPD this process is
known to be coadsorption of Cu2+ and sulfate species. We
retrieved the potential dependent surface coverages of Cu and sulfate
during the first Cu UPD stage with the single additional assumption
that the Cu coverage in the first stage of the Cu UPD reaches 2/3
ML. In addition, we found that both HSO4(ad) and SO4(ad) are adsorbed on the surface with a noticeable surplus
of bisulfate. For the second stage of Cu UPD, i.e., the completion
of the first (1 × 1) Cu monolayer, our data indicates a charge-neutral
side process, which cannot be inferred from the current potential
relationship as measured, e.g., by cyclic voltammetry. This side process
has considerably high positive reaction entropy and is present also
for Cu UPD in perchlorate solutions. We interpret this side process
as substitution of adsorbed sulfate or perchlorate anions by oxygen
species upon completion of the first Cu monolayer, whereby the potential
of zero charge shifts negatively.