2009
DOI: 10.1016/j.chemphys.2008.11.023
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Adsorption of Li on Cu(110): Density-functional calculations

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Cited by 7 publications
(2 citation statements)
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“…The E ads of LM (−2.625 eV) is less than that of Cu (average ∼−2.308 eV), meaning that the LM preferentially absorbs the lithium rather than depositing on the Cu. 36 Therefore, a lithiophilic gradient is formed due to the introduction of the LM layer. Compared with the pure Cu foam, the lithiophilic gradient results in Li + being preferentially attracted to the LM layer with a low barrier, with the LM layer serving as the induced deposition area in the MGC.…”
Section: Resultsmentioning
confidence: 99%
“…The E ads of LM (−2.625 eV) is less than that of Cu (average ∼−2.308 eV), meaning that the LM preferentially absorbs the lithium rather than depositing on the Cu. 36 Therefore, a lithiophilic gradient is formed due to the introduction of the LM layer. Compared with the pure Cu foam, the lithiophilic gradient results in Li + being preferentially attracted to the LM layer with a low barrier, with the LM layer serving as the induced deposition area in the MGC.…”
Section: Resultsmentioning
confidence: 99%
“…The ab initio calculations describing atomic interactions with high accuracy, have been utilized to investigate the microscopic details of the Li-Cu interface, such as the study of adsorption and diffusion behaviors of Li atoms on the Cu surface. [16][17][18] Nevertheless, the accessible spatiotemporal scales of simulations are limited due to the high computational cost. Moreover, the dynamic processes of interest (e.g., deposition or growth of Li on the Cu substrate) extend far beyond the picosecond time scale, thus, alternatives to ab initio calculations are required.…”
Section: Doi: 101002/admi202201346mentioning
confidence: 99%