We predict the structures and detailed energetics for the
dissociative adsorption of NH3 to form NH2 and
H
adsorbed on a single Si dimer on the Si(100)-2 × 1 surface at
the MRSDCI (multireference single and double
excitation configuration interaction) level of theory. We predict
that this dissociation involves two steps: (i)
barrierless molecular chemisorption of NH3 followed by (ii)
activated N−H bond cleavage of NH3(a) to
form
NH2(a) + H(a). While the second step
involves a barrier, its relatively small height renders the overall
reaction
barrierless. The extremely high adsorption exothermicity (∼75
kcal/mol) results in a very high desorption
barrier. These results can explain the experimentally determined
high sticking probability of NH3, the
observation of NH3(a) at low temperatures, and the observed
stability of NH2(a) and H(a) on the
Si(100) surface
up to ∼600 K. Additionally, our CASSCF level (complete active
space self-consistent-field) calculated
geometries for the dissociatively adsorbed species agree with
structures proposed to explain experimental
data.