Using low-energy forward recoil spectrometry (LE-FRES) and dynamic secondary ion mass spectrometry (DSIMS), we measure the interfacial excess, z*, and the volume fraction profiles of a bromine functionalized polymer chains at the polymer/inorganic substrate interface. Specifically, we investigate a blend of polystyrene (PS) homopolymer and a deuterium-labeled poly-d-(styrene-ran-4-bromostyrene) (dPBrxS) random copolymer, where the mole fraction of 4-bromostyrene units in the chain is x ) 0.06. Our aim is to measure the strength of interaction of bromine functionalized segments of dPBr0.06S with silicon oxide, SiOx, and hydrogen-terminated silicon, SiH, surfaces. The results from both LE-FRES and DSIMS show that dPBr0.06S segregates at both polymer/SiOx and polymer/SiH interfaces, demonstrating that that the bromine groups do interact favorably with both surface types. We also use the self-consistent mean-field model (SCMF) to calculate the dPBr0.06S concentration profile and z* at the polymer/substrate interface and to determine the value of the interaction energy between 4-bromostyrene segments and the substrate. The comparison of experimental and SCMF results provides the interaction energy between the brominated polystyrene repeat unit and both substrate types, namely dPBr1S SiOx ) -0.18kT and dPBr1S SiH ) -0.22kT. These results show that the interaction of the brominated segment with SiH surface is ca. 20% stronger than that with the SiOx surface.