1997
DOI: 10.1002/adma.19970091107
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Additive fabrication of integrated ferroelectric thin‐film capacitors using self‐assembled organic thin‐film templates

Abstract: Copolymer grafting: Grafting of the copolymer onto a glass substrate was effected according to Scheme 1. A freshly cleansed glass slide was immersed (under dry nitrogen atmosphere in a glove box) into a 5 % vlv solution of SiC14 in dry hexane for 20 min and then washed with dry hexane and chloroform, prior to immersion into a solution of RCPTh in dry chloroform (1 mgl mL). After 12 h, the glass slide was rinsed successively with chloroform and THE Subsequently, the glass slide was sonicated in dry hexane at ab… Show more

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Cited by 54 publications
(55 citation statements)
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“…CP is a particularly promising method that has the potential for patterning large areas quickly. It was first described by Whitesides and Kumar (7) and has since been explored by us and others for constructing simple devices in the areas of lasers (11), fiber optics (12), inorganic microelectronics (13)(14)(15), microfluidic analytical chemistry (16), and biotechnology (17). We recently reported processing conditions that enable CP to be used for fabricating the source͞drain level in a variety of basic organic electronic devices (8,(18)(19)(20).…”
Section: Methodsmentioning
confidence: 99%
“…CP is a particularly promising method that has the potential for patterning large areas quickly. It was first described by Whitesides and Kumar (7) and has since been explored by us and others for constructing simple devices in the areas of lasers (11), fiber optics (12), inorganic microelectronics (13)(14)(15), microfluidic analytical chemistry (16), and biotechnology (17). We recently reported processing conditions that enable CP to be used for fabricating the source͞drain level in a variety of basic organic electronic devices (8,(18)(19)(20).…”
Section: Methodsmentioning
confidence: 99%
“…Later work by the same research group demonstrated the use of the technique for patterning tantalum(V) oxide (Ta 2 O 5 ) on silicon, aluminized silicon, and platinized silicon wafers 11 and PZT on platinum. 12 They achieved line widths as small as 4 µm with 100 nm resolution and vertical thickness of 80 to 120 nm with their resulting patterned thin film oxides. 11 Their work is well summarized in a review article.…”
Section: Introductionmentioning
confidence: 99%
“…The use of the soft lithography techniques pioneered by Whitesides and co-workers 9 has resulted in the development of new fabrication methods for micropatterned ceramic thin films. 8,[10][11][12][13][14][15][16][17][18][19][20] The techniques used for patterning inorganic thin films fall into three categories. The first uses the elastomeric mold as a stamp to effect the microcontact printing (µCP) of selfassembled monolayers (SAM) of surfactants, most commonly octadecyltrichlorosilane (OTS).…”
Section: Introductionmentioning
confidence: 99%
“…The results described above encouraged us to examine the utility of this form of soft lithography as a potentially efficient method for the fabricating important forms of microelectronics devices. [20][21][22]42,43 To do so, we carried out a process sequence yielding silicon-based thin-film transistors using SOI source wafers as a model system. The details of the procedures used to fabricate these transistors are given in the Experiment section.…”
Section: -3mentioning
confidence: 99%
“…Representative soft-lithographic techniques that have found varying degrees of attention in research and for possible applications in technology include microcontact printing ͑ CP͒, [5][6][7] replica molding ͑REM͒, 8,9 microtransfer molding ͑ TM͒, [10][11][12][13] micromolding in capillaries ͑MIMIC͒, [14][15][16] and solvent assisted micromolding ͑SAMIM͒. 17 These techniques are useful for fabricating a variety of functional components and devices for use in areas such as optics, 18,19 microelectronics, [20][21][22] microanalysis, [23][24][25][26] and microelectromechanical system ͑MEMS͒. 27 The work reported to date establishes the broad utility of PDMS as a foundation material for soft-lithographic patterning-its properties being exploited with benefit for myriad forms of contact-lithographic patterning and, more recently, as a component material for constructing the complex forms of MEMS and microfluidic devices.…”
Section: Introductionmentioning
confidence: 99%