2013
DOI: 10.1002/mop.27790
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Adaptive Optics Integrated Surface Roughness Measurement of Sputtered PT Film on Silicon Substrate

Abstract: A new optical inspection system for in situ surface roughness measurement of sputtered Pt film on silicon is developed. In this study, we present an in‐process measurement of surface roughness by combining an optical probe of laser‐scattering phenomena and adaptive optics (AO) for aberration correction. The aim of this study was to demonstrate the necessity for AO compensation in regions containing turbulences. Measurement results of eight Pt film on top of P‐type silicon wafer samples with a roughness ranging… Show more

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Cited by 3 publications
(2 citation statements)
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“…El-Hayek et al [18] developed an optical single-scanning probing system to measure and characterize the form of an aspheric lens. Fuh et al [19] developed a system for in-process measurement of surface roughness by combining an optical probe and adaptive optics. Speckle metrology [20] has been verified and deployed to measure the surface roughness of bulk metallic glasses through a laser-scattering method with adaptive optics, and can be integrated into a manufacturing process for in-situ measurement [21].…”
Section: Introductionmentioning
confidence: 99%
“…El-Hayek et al [18] developed an optical single-scanning probing system to measure and characterize the form of an aspheric lens. Fuh et al [19] developed a system for in-process measurement of surface roughness by combining an optical probe and adaptive optics. Speckle metrology [20] has been verified and deployed to measure the surface roughness of bulk metallic glasses through a laser-scattering method with adaptive optics, and can be integrated into a manufacturing process for in-situ measurement [21].…”
Section: Introductionmentioning
confidence: 99%
“…Gao et al [9] developed an optical probe by combining a displacement sensor and an angle meter to measure the profile of mirror surfaces. Fuh et al [87] developed an in-process measurement of surface roughness by combining an optical probe and adaptive optics. Speckle metrology [69,88,89] has been tested and used to measure surface roughness of semiconductor wafer through light scattering method and has shown feasibility to be integrated into a manufacturing cell for in-situ measurement [55].…”
Section: Mirror Finish Surface Measurementmentioning
confidence: 99%