2023
DOI: 10.1016/j.apsusc.2023.157019
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Adaptive half-metallicity via magnetic proximity in an electrically sensitive 1T’-WTe2/CrBr3 vdW heterostructure

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Cited by 8 publications
(4 citation statements)
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“…As the applied field increases further, polarity changes from negative to positive, and accordingly the majority of the spin-up states dominate at E F . 41 The negative electric field calculation for both PC and APC situations is also considered, which hosts similar spin polarization behaviour, as shown in Fig. S11 and S12 (ESI†), respectively.…”
Section: Resultsmentioning
confidence: 98%
“…As the applied field increases further, polarity changes from negative to positive, and accordingly the majority of the spin-up states dominate at E F . 41 The negative electric field calculation for both PC and APC situations is also considered, which hosts similar spin polarization behaviour, as shown in Fig. S11 and S12 (ESI†), respectively.…”
Section: Resultsmentioning
confidence: 98%
“…In recent years, a wide variety of narrow band gap semiconductor-based PDs have been reported [29][30][31][32][33][34][35][36][37][38][39][40]. Such PDs are still restricted in practical application of devices because of lacking broadband absorption, low stability and slow responses.…”
Section: Two Dimensional (2d) Materialsmentioning
confidence: 99%
“…The pristine 1T-MoS 2 exhibits high thermoelectric performance with a Seebeck coefficient value of 85.6 μV/K . Further, 2D ferromagnetism in the CrI 3 layer offers wide bandgap spin transport pathways along with peculiar physical properties, thermoelectric properties, and robust proximity effect. ML-CrI 3 is reported to be a potential candidate for TE application, which exhibits a Seebeck coefficient value of 291 μV K –1 at 800 K and the figure of merit of the order 0.95 and 1.57. , The proximity effect between the adjacent CrI 3 and MoS 2 layers is expected to be further enhanced upon being subjected to the twist effect. The twisted heterostructure hosts macroscopic TE characteristics via local electronic structure manipulation.…”
Section: Introductionmentioning
confidence: 99%