Acrylic resins with oxetane pendant groups for free radical and cationic dual-curing photoresists

Ding, Yanhua; Xin, Yangyang; Zhang, Qiang; Zou, Yingquan

doi:10.1016/j.matdes.2021.110370

Cited by 20 publications

(17 citation statements)

References 46 publications

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“…Additionally, shadow areas where UV light is blocked by the geometry of the mold also polymerize at slower rates, inducing additional tensions. The shrinkage of acrylic resins during photopolymerization has been previously reported by several authors in the literature [ 35 , 36 , 37 , 38 ], with different strategies to decrease the tensions during the polymerization, such as modifying the chemistry of the oligomers and monomers, the use of thiol-ene resins, or thinning the samples. Although thinning the samples may be beneficial in our case to achieve uniform curing throughout the sample, solid pieces with uniform thicknesses of 2 mm are required to perform electrical measurements according to ASTM D257 specifications.…”

Section: Resultsmentioning

confidence: 99%

Stereolithography of Semiconductor Silver and Acrylic-Based Nanocomposites

et al. 2022

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Polymer nanocomposites (PNCs) attract the attention of researchers and industry because of their potential properties in widespread fields. Specifically, electrically conductive and semiconductor PNCs are gaining interest as promising materials for biomedical, optoelectronic and sensing applications, among others. Here, metallic nanoparticles (NPs) are extensively used as nanoadditives to increase the electrical conductivity of mere acrylic resin. As the in situ formation of metallic NPs within the acrylic matrix is hindered by the solubility of the NP precursors, we propose a method to increase the density of Ag NPs by using different intermediate solvents, allowing preparation of Ag/acrylic resin nanocomposites with improved electrical behaviour. We fabricated 3D structures using stereolithography (SLA) by dissolving different quantities of metal precursor (AgClO4) in methanol and in N,N-dimethylformamide (DMF) and adding these solutions to the acrylic resin. The high density of Ag NPs obtained notably increases the electrical conductivity of the nanocomposites, reaching the semiconductor regime. We analysed the effect of the auxiliary solvents during the printing process and the implications on the mechanical properties and the degree of cure of the fabricated nanocomposites. The good quality of the materials prepared by this method turn these nanocomposites into promising candidates for electronic applications.

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Section: Resultsmentioning

confidence: 99%

Stereolithography of Semiconductor Silver and Acrylic-Based Nanocomposites

et al. 2022

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“…The prepared DFR formulas contained a polyethylene terephthalate film, a protective polyethylene film, a photosensitive resin [ 49 ], bisphenol-A-ethoxylate dimethacrylate as the monomer, BCIM (3 wt%) as the photoinitiator and COXEs (0.1 wt%) as the coinitiator.…”

Section: Methodsmentioning

confidence: 99%

Coumarin Ketoxime Ester with Electron-Donating Substituents as Photoinitiators and Photosensitizers for Photopolymerization upon UV-Vis LED Irradiation

Fan

Sun

et al. 2022

Polymers

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High-performance photoinitiators (PIs) are essential for ultraviolet–visible (UV-Vis) light emitting diode (LED) photopolymerization. In this study, a series of coumarin ketoxime esters (COXEs) with electron-donating substituents (tert-butyl, methoxy, dimethylamino and methylthio) were synthesized to study the structure/reactivity/efficiency relationships for substituents for the photoinitiation performance of PIs. The introduction of heteroatom electron-donating substituents leads to a redshift in the COXE absorption of more than 60 nm, which matches the UV-Vis LED emission spectra. The PIs also show acceptable thermal stability via differential scanning calorimetry (DSC) and thermal gravimetric analysis (TGA). The results from real-time Fourier transform infrared (RT-FTIR) measurements indicate that COXEs show an excellent photoinitiation efficiency for free radical polymerization under UV-Vis LED irradiation (365–450 nm); in particular, the conversion efficiency for tri-(propylene glycol) diacrylate (TPGDA) polymerization initiated by COXE-O and COXE-S (4.8 × 10−5 mol·g–1) in 3 s can reach more than 85% under UV-LED irradiation (365, 385 nm). Moreover, the photosensitization of COXEs in the iodonium hexafluorophosphate (Iod-PF6) and hexaarylbiimidazole/N-phenylglycine (BCIM/NPG) systems was investigated via RT-FTIR. As a coinitiator, COXEs show excellent performance in dry film photoresist (DFR) photolithography. This excellent performance of COXEs demonstrates great potential for UV-curing and photoresist applications, providing a new idea for the design of PIs.

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“…[105][106][107][108] As displayed in Figure 28, the polyester (PET) film, photoresist layer and polyethylene (PE) film from bottom to top together constitute a complete DFRs. [109] The PET film plays the role of bearing photoresist layer, and PE film is used to avoid the deterioration caused by the contact between photoresist layer and dusts or oxygen, in addition, prevents adhesion between multilayer film.…”

Section: Pcb Dry Film Photoresistmentioning

confidence: 99%

“…The photoresist layer of DFRs generally composed of resins, monomers, oligomers, photoinitiators, dyes and other additives. [109][110][111] Resin possesses the largest mass ratio in all components of DFRs, and directly determines the resolution, adhesiveness, developing time and flexibility, etc. the most commonly-used PIs for DFRs are hexarylbiimidazole (HABIs) compounds, [43] among which 2,2-bis(2-chlorophenyl)-4,4,5,5tetraphenyl-1,2-biimidazole (BCIM) has been broadly employed due to its merits of good efficiency and discoloration property.…”

Section: Pcb Dry Film Photoresistmentioning

confidence: 99%

Introduction of Photopolymerization Technology and Application

Zang²,

Xin³

et al. 2023

Preprint

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Photopolymerization as an energy-saving and environment-friendly technology has been applied in many fields and developed continuously since the middle of the 20th century. Today, photopolymerization technology is ubiquitous in every aspect of our lives. This review starts from the principle of photopolymerization reaction, introduces the process of photopolymerization, initiation mechanism of photoinitiators and three kinds of polymerization methods according to the wavelength of irradiation source. Subsequently, review focuses on the application of photopolymerization technology in thiol-based click reaction, 3D printing, photoresist, hydrogels and other fields, so as to demonstrate its irreplaceable role in the present.

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Acrylic resins with oxetane pendant groups for free radical and cationic dual-curing photoresists

Cited by 20 publications

References 46 publications

Stereolithography of Semiconductor Silver and Acrylic-Based Nanocomposites

Stereolithography of Semiconductor Silver and Acrylic-Based Nanocomposites

Coumarin Ketoxime Ester with Electron-Donating Substituents as Photoinitiators and Photosensitizers for Photopolymerization upon UV-Vis LED Irradiation

Introduction of Photopolymerization Technology and Application

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