Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick
Ping-Che Lee,
Aaron J. McLeod,
Mingeun Choi
et al.
Abstract:High-power
impulse magnetron sputtering (HiPIMS) plus kick is a
physical vapor deposition method that employs bipolar microsecond-scale
voltage pulsing to precisely control the ion energy during sputter
deposition. HiPIMS plus kick for AlN deposition is difficult since
nitride deposition is challenged by low surface diffusion and high
susceptibility to ion damage. In this current study, a systematic
examination of the process parameters of HiPIMS plus kick was conducted.
Under optimized main negative pulsing c… Show more
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