1989
DOI: 10.1002/jemt.1060120103
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Achievement of atomic resolution electron microscopy

Abstract: Atomic-level details are easily resolved in the latest generation of intermediate voltage electron microscopes, but structural information on the same scale can only be extracted under certain specific conditions. Some understanding of imaging theory, as well as an awareness of correct operating conditions, is required for reliable image interpretation. Several representative examples are chosen to illustrate the possibilities for atomic-resolution imaging of materials, and perspectives and outlook for the tec… Show more

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Cited by 10 publications
(2 citation statements)
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References 59 publications
(45 reference statements)
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“…Diffusion rates and jump frequencies were estimated, for example with Ag atoms (Isaacson et al 1976) and U atoms (Isaacson et al 1971, Wall et al 1977. Surface profile imaging is ideally suited to atomic-resolution studies of surface dynamics (Smith 1985). Using the technique, successive exposures from extended Au (110) surfaces revealed movement of Au atomic columns (Smith and Marks 1985), while rapid structural changes and the existence of atom clouds extending out from Au surfaces were also reported (Bovin et al 1985).…”
Section: Dynamic Eventsmentioning
confidence: 99%
“…Diffusion rates and jump frequencies were estimated, for example with Ag atoms (Isaacson et al 1976) and U atoms (Isaacson et al 1971, Wall et al 1977. Surface profile imaging is ideally suited to atomic-resolution studies of surface dynamics (Smith 1985). Using the technique, successive exposures from extended Au (110) surfaces revealed movement of Au atomic columns (Smith and Marks 1985), while rapid structural changes and the existence of atom clouds extending out from Au surfaces were also reported (Bovin et al 1985).…”
Section: Dynamic Eventsmentioning
confidence: 99%
“…Transmission electron microscopes have improved perhaps ten-fold in resolving power since then (2), and low voltage scanning electron microscopes commonly used in the fab for measurement and inspection have improved from about 2Onm in the mid 80s to 5nm or less today (3). See Figure 2.…”
Section: Feynman's Challengementioning
confidence: 99%