Accurate characterization of a thick multilayer structure using the marking-layer-based scanning electron microscopy method

Huang, Qiushi; Li, Haochuan; Zhu, Jun; Wang, Zhanshan; Chen, Hong

doi:10.1088/0022-3727/46/27/275105

Cited by 5 publications

(1 citation statement)

References 17 publications

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“…A nonlinear drift of the MM period was estimated to be approximately 0.05 nm in the complete MM stack. This kind of thickness drift was also found in other works [18] and its effect will be further discussed later. The surface morphology of the multilayer was measured by atomic force microscopy (AFM) with a scanning area of 1 × 1 µm 2 .…”

Section: Resultssupporting

confidence: 79%

Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region

Huang

Feng

et al. 2019

J. Phys. D: Appl. Phys.

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To develop highly efficient narrow-bandwidth multilayer optics for the soft X-ray (SXR) spectroscopy, a low optical contrast MoSi 2 /Si lamellar multilayer grating (LMG) was proposed and developed. The low contrast LMG allows for a large lamel width which can potentially achieve higher resolution than the conventional LMG and simplify the fabrication. As a first demonstration, a MoSi 2 /Si multilayer with a d-spacing of 5 nm and 180 bilayers was deposited. The lamellar grating structure with a period of 614 nm, lamel-to-period ratio of 0.38, and lamel height of 670 nm was fabricated in the multilayer with reactive ion etching process. The SXR measurements show a high 0th-order diffraction efficiency of 16%-33% at 876 eV-1648 eV, which reaches around 80% of the unetched multilayer reflectivity. A maximal bandwidth reduction of 2.2 times was obtained compared with the multilayer mirror, indicating an energy resolution of E/ΔE = 108 at 1183 eV. The resolution can be further improved by reducing the multilayer d-spacing and increasing the etching depth.

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Section: Resultssupporting

confidence: 79%

Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region

Huang

Feng

et al. 2019

J. Phys. D: Appl. Phys.

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Analysis of tilted multilayer Laue lens with stochastic layer thickness error

Liao

Wang

et al. 2014

Optics Communications

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Bulk characterization in a Monte Carlo particle-deposition model with a novel adherence-potential barrier

Galindo

Huertas

Carrasco-Sanz

et al. 2016

Journal of Applied Physics

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The aim of this work is to analyze in more depth a model of particle deposition by characterizing different parameters such as profile density, bonds and perimeter, and substrate coverage, all being involved in the description of deposits as bulk. Thus, this study is an extension of a previous work on non-equilibrium interface-growth systems where two different interface-growth models, called Standard Adherence Rule Model and Potential Adherence Rule Model, were characterized. In this work, bulk characterization is implemented for the complete range of Peclet numbers. The zones of density profile (Near-Wall, Plateau, and Active-Growth) are studied by proposing an adjustment for each of them and determining the full-setting density profile depending on the Peclet number. The density profiles are compared with other one- and two-stage models. Furthermore, an algorithm is proposed to calculate the number of bonds of the particles and the perimeter that a substrate forms over time. Finally, to analyze the coating, its temporal behavior is adjusted to an exponential function by comparing the results with those found for Random Sequential Adsorption models which describe systems like colloidal particles on solid substrates, adsorption of proteins at mineral surfaces, or oxidation of one-dimensional polymer chains.

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Accurate characterization of a thick multilayer structure using the marking-layer-based scanning electron microscopy method

Cited by 5 publications

References 17 publications

Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region

Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region

Analysis of tilted multilayer Laue lens with stochastic layer thickness error

Bulk characterization in a Monte Carlo particle-deposition model with a novel adherence-potential barrier

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Accurate characterization of a thick multilayer structure using the marking-layer-based scanning electron microscopy method

Cited by 5 publications

References 17 publications

Narrowband lamellar multilayer grating with low contrast MoSi2/Si materials for the soft x-ray region

Narrowband lamellar multilayer grating with low contrast MoSi2/Si materials for the soft x-ray region

Analysis of tilted multilayer Laue lens with stochastic layer thickness error

Bulk characterization in a Monte Carlo particle-deposition model with a novel adherence-potential barrier

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Product

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Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region

Narrowband lamellar multilayer grating with low contrast MoSi₂/Si materials for the soft x-ray region