“…The focus was then also set on the identification of technical standards used to perform an objective metrological characterization of O3DCMS (ISO, 2021; VDI/VDE, 2012). Moreover, a list of the most commonly used artifacts was gathered (Acko et al, 2012;Eiríksson et al, 2016;Guidi, 2013;Hess et al, 2014;McCarthy et al, 2011;Mendricky & Sobotka, 2020), see Figure 1. In general, O3DCMS can be classified in three categories (Beraldin et al, 2015;Faugeras, 1993;Giancola et al, 2018;Huang & Zhang, 2006;Luhmann, 2010) depending on their working distance, namely nano/micro, close, and mid-to-long ranges.…”