2021
DOI: 10.1063/5.0076980
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Acceptor-oxygen defects in silicon: The electronic properties of centers formed by boron, gallium, indium, and aluminum interactions with the oxygen dimer

Abstract: Paper published as part of the special topic on Defects in Semiconductors 2022 This paper was selected as an Editor's Pick ARTICLES YOU MAY BE INTERESTED IN Impact of thermal annealing on deep levels in nitrogen-implanted β-Ga 2 O 3 Schottky barrier diodes

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Cited by 5 publications
(6 citation statements)
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“…An increase in acceptor size also results in weaker binding energies for complexes involving Ga acceptor atoms. 15 We observe that the fine structure of the Ga-doped Cz Si does not change upon 1 Sun illumination, and the sample remains paramagnetic after 24 hr of exposure. The energy levels for the B and Ga acceptors are 0.045 and 0.065 eV, respectively.…”
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confidence: 72%
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“…An increase in acceptor size also results in weaker binding energies for complexes involving Ga acceptor atoms. 15 We observe that the fine structure of the Ga-doped Cz Si does not change upon 1 Sun illumination, and the sample remains paramagnetic after 24 hr of exposure. The energy levels for the B and Ga acceptors are 0.045 and 0.065 eV, respectively.…”
mentioning
confidence: 72%
“…We observe a sharp EPR signal at ∼330 mT, which is due to background contamination within the EPR sample cavity. An increase in acceptor size also results in weaker binding energies for complexes involving Ga acceptor atoms . We observe that the fine structure of the Ga-doped Cz Si does not change upon 1 Sun illumination, and the sample remains paramagnetic after 24 hr of exposure.…”
mentioning
confidence: 76%
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