“…Finally, it is shown that in TiAl the oxygen diffusion through the Al-layer is almost barrierless, while the migration barrier through the Ti-layer is significantly higher (2.17 eV). In contrast to [21], in our previous work [22] the diffusion coefficient D = D 0 exp(-E a /k B T), where D 0 -the pre-exponential factor and E a -the activation energy, was calculated using a specific value of frequency (ν) for each elementary jump and the corresponding energy barriers along the considered paths. A technique that is an extension of the theory proposed in [23] was used to describe the oxygen diffusion in α-Ti.…”