2007
DOI: 10.1016/j.surfcoat.2007.06.063
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Abrasive wear of texture-controlled CVD α-Al2O3 coatings

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Cited by 34 publications
(10 citation statements)
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“…[2][3][4] The thermodynamically stable corundum (α)-phase has been of primary interest, and the latest increase in tool life performance from α-Al2O3 coatings, comes from the introduction of highly (0001) textured α-Al2O3. 5,6 These CVD coatings are, however, limited by their inherent problem of cracking upon cooling due to differences in thermal expansion between coating and substrate and the tensile stresses formed in the film. 6 To address these challenges, physical vapor deposition (PVD) techniques, such as DC arc, 7 -9 pulsed DC arc 10 and different types of sputtering techniques 11 -17 have been used at lower deposition temperatures than CVD.…”
Section: Introductionmentioning
confidence: 99%
“…[2][3][4] The thermodynamically stable corundum (α)-phase has been of primary interest, and the latest increase in tool life performance from α-Al2O3 coatings, comes from the introduction of highly (0001) textured α-Al2O3. 5,6 These CVD coatings are, however, limited by their inherent problem of cracking upon cooling due to differences in thermal expansion between coating and substrate and the tensile stresses formed in the film. 6 To address these challenges, physical vapor deposition (PVD) techniques, such as DC arc, 7 -9 pulsed DC arc 10 and different types of sputtering techniques 11 -17 have been used at lower deposition temperatures than CVD.…”
Section: Introductionmentioning
confidence: 99%
“…Researchers have conducted many studies on ceramic coatings [6][7][8][9][10]. Yet very little information has been reported on the effect of abrasive grain size on the materials with Al 2 O 3 .…”
Section: Introductionmentioning
confidence: 99%
“…Ruppi et al prepared (0 1 2), (1 0 4), (0 0 1)-oriented ␣-Al 2 O 3 films on Ti(C, O) and Ti(C, N) intermediate layers deposited on WC-Co substrate and reported that the films with (0 0 6) and (1 0 4) orientations showed higher hardness and modulus than those with random or the other orientations [4,[7][8][9]. It is commonly understood that the crystal orientation depends not only on the substrate but also on the deposition temperature and the total pressure in the CVD process.…”
Section: Introductionmentioning
confidence: 99%