Abrasive-free chemical-mechanical planarization (CMP) of gold for thin film nano-patterning
Raphael Gherman,
Guillaume Beaudin,
Romain Stricher
et al.
Abstract:Despite high demand for gold film nanostructuring, patterning gold at the nanoscale still presents considerable challenges for current foundry-compatible processes. Here, we present a method based on abrasive-free chemical mechanical...
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