Ablation of Poly(methyl Methacrylate) by a Single Pulse of Soft X-Rays Emitted From Z-Pinch and Laser-Produced Plasmas

Juha, L.; Krása, J.; Präg, A. R.; Cejnarová, Andrea; Chvostová, D.; Rohlena, K.; Jungwirth, K.; Kravárik, J.; Kubeš, P.; Bakshaev, Yu. L.; Chernenko, A. S.; Korolev, V. D.; Tumanov, V. I.; Tumanov, M. I.; Bernardinello, A.; Ullschmied, J.; Boody, F.P.

doi:10.1142/s0218625x02002257

Cited by 38 publications

(21 citation statements)

References 37 publications

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“…Our previous XUV/x-ray interaction studies were mainly focused on basic characteristics of single-shot ablation processes, namely the determination of the attenuation length and the ablation threshold [12][13][14][15][16][17][18][19]22]. All of the results were for various solid state materials determined using a method reported by Liu [21] based on the morphology of the ablated crater.…”

Section: Single-shot Damage Experimentsmentioning

confidence: 99%

“…An extension of ablation studies into soft xray/XUV region has been enabled by the above-mentioned development of new sources. A few papers have been published dealing with topics of soft x-ray/XUV laser damage to various solid materials [12][13][14][15][16][17][18][19]22], primarily motivated by testing materials for short wavelength optical elements. All of the reflecting optical components used in soft x-ray beamlines have to be resistant to damage by energetic photons (30eV -200eV), but also have to provide the highest possible reflectivity for a long period of time.…”

Section: Introductionmentioning

confidence: 99%

“…This means that a single photon is able to release a fragment (atom or molecular fraction) from and from beneath the material surface with some non-zero probability by breaking its bonds to the closest neighbouring atoms. This single-photon action was proposed and distinguished from the ablation, i.e., collective phenomenon, earlier [13,15,27], but not yet investigated quantitatively within one model taking into account both phenomena. Typically, the desorption regime is observed at tails of the beam where the absorbed dose is sufficiently low.…”

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confidence: 99%

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Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Chalupský¹,

Juha²,

Hájková³

et al. 2008

Opt. Express

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Abstract:We report the first observation of single-shot soft x-ray laser induced desorption occurring below the ablation threshold in a thin layer of poly (methyl methacrylate) -PMMA. Irradiated by the focused beam from the Free-electron LASer in Hamburg (FLASH) at 21.7nm, the samples have been investigated by atomic-force microscope (AFM) enabling the visualization of mild surface modifications caused by the desorption. A model describing non-thermal desorption and ablation has been developed and used to analyze single-shot imprints in PMMA. An intermediate regime of materials removal has been found, confirming model predictions. We also report below-threshold multiple-shot desorption of PMMA induced by high-order harmonics (HOH) at 32nm. Short-time exposure imprints provide sufficient information about transverse beam profile in HOH's tight focus whereas long-time exposed PMMA exhibits radiation-initiated surface hardening making the beam profile measurement infeasible. B. Rus, A. Carillon, P. Dhez, P. Jaeglé, G. Jamelot, A. Klisnick, M. Nantel, and P. Zeitoun, "An efficient, high-brightness soft X-ray laser at 21.2 nm," Phys. Rev. A55, 3858-3873 (1997 S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, "Demonstration of a desk-top size high repetition rate soft x-ray laser," Opt. Express 13, 4050-4055 (2005). 10. P. E. Dyer, "Excimer laser polymer ablation: twenty years on," Appl. Phys. A77, 167-173 (2003), and references cited therein. 11. L. V. Zhigilei, B. J. Garrison, "Molecular dynamics simulation study of the fluence dependence of particle yield and plume composition in laser desorption and ablation of organic solids," Appl. Phys. Lett. 74, 1341-1343 (1999)

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Section: Single-shot Damage Experimentsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

mentioning

confidence: 99%

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Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Chalupský¹,

Juha²,

Hájková³

et al. 2008

Opt. Express

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“…[1][2][3] However, polymer ablation induced by extreme ultraviolet ͑XUV͒ radiation with wavelength shorter than 100 nm is discussed in only a small number of publications. Poly ͑butene-1 sulphone͒, 4 PMMA, 5,6 poly ͑ethylene terephthalate͒, 7 and PTFE 5,8 were ablated by incoherent, nonmonochromatic XUV emission from laser-produced plasma. A Z-pinch plasma was used as an XUV source for ablation of PMMA 5 and PTFE.…”

mentioning

confidence: 99%

“…Poly ͑butene-1 sulphone͒, 4 PMMA, 5,6 poly ͑ethylene terephthalate͒, 7 and PTFE 5,8 were ablated by incoherent, nonmonochromatic XUV emission from laser-produced plasma. A Z-pinch plasma was used as an XUV source for ablation of PMMA 5 and PTFE. 5,9 Very recently PMMA was efficiently ablated by sub-100-fs pulses of 86-nm-radiation provided by a free-electron laser.…”

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Ablation of organic polymers by 46.9-nm-laser radiation

Juha

Bittner

Chvostová

et al. 2005

Applied Physics Letters

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We report results of the exposure of poly͑tetrafluoroethylene͒ -͑PTFE͒, poly͑methyl methacrylate͒ -͑PMMA͒, and polyimide -͑PI͒ to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from ϳ0.1 to ϳ10 J/cm 2 . The ablation rates were found to be similar for all three materials, ϳ80-90 nm/ pulse at 1 J / cm 2 . The results suggest that the ablation of organic polymers induced by intense extreme ultraviolet laser radiation differs from that corresponding to irradiation with longer wavelengths. © 2005 American Institute of Physics. ͓DOI: 10.1063/1.1854741͔ Ablation of organic polymers by optical radiation, in particular from excimer lasers, has been extensively studied. 1-3 However, polymer ablation induced by extreme ultraviolet ͑XUV͒ radiation with wavelength shorter than 100 nm is discussed in only a small number of publications. Poly ͑butene-1 sulphone͒, 4 PMMA, 5,6 poly ͑ethylene terephthalate͒, 7 and PTFE 5,8 were ablated by incoherent, nonmonochromatic XUV emission from laser-produced plasma. A Z-pinch plasma was used as an XUV source for ablation of PMMA 5 and PTFE. 5,9 Very recently PMMA was efficiently ablated by sub-100-fs pulses of 86-nm-radiation provided by a free-electron laser. 7,10 A large number of studies on direct photoetching of the organic polymers induced by XUV synchrotron radiation were also reported. 11-13 However, according to Haglund's criterion 14 this photoinduced material removal is closer to laser desorption than to laser ablation because of a low peak power of the photon beams delivered by a synchrotron radiation source.The recent advances in compact high repetition rate XUV lasers 15 producing nanosecond pulses of monochromatic radiation with energy of several hundred micro-Joules opens the possibility to study materials ablation in a new regime. In this letter, we report on the ablation behavior of three common organic polymers: PTFE, PMMA, and PI, irradiated with an intense focused 46.9-nm-laser beam. The ablation processes induced by nanosecond pulses of 46.9-nm-laser radiation are compared with those occurring in the polymer materials irradiated with conventional longer wavelength laser sources.The samples studied here were 1-mm-thick sheets ͑Goodfellow͒ cut into 2.0ϫ 5.0 mm 2 chips. The PTFE and PI samples were polished, while the PMMA was used directly with no additional treatment. The samples were placed into vacuum chamber where they were exposed to 1.2 ns FWHM pulses of 46.9 nm radiation from a capillary discharge Nelike Ar laser. 15 Laser pulses with energy of ϳ130 J were focused onto the sample surfaces by a spherical Sc/ Si multilayer-coated mirror 16 with measured reflectivity of ϳ30%. A motorized positioning system was used to translate the samples along the beam optical axis, as well as in the directions perpendicular to the beam. 17 The former motion allowed us to vary the irradiation fluence by controlling the laser spot diameter on the sample surface, while the pulse energy and duration were kept constant. Figure 1 shows an optical micrograph of a PM...

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Materials Modification with Intense Extreme Ultraviolet Pulses from a Compact Laser

Grisham

Vaschenko

Menoni

et al. 2007

Laser Ablation and Its Applications

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Ablation of Poly(methyl Methacrylate) by a Single Pulse of Soft X-Rays Emitted From Z-Pinch and Laser-Produced Plasmas

Cited by 38 publications

References 37 publications

Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Ablation of organic polymers by 46.9-nm-laser radiation

Materials Modification with Intense Extreme Ultraviolet Pulses from a Compact Laser

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