2013 IEEE Radio and Wireless Symposium 2013
DOI: 10.1109/rws.2013.6486706
|View full text |Cite
|
Sign up to set email alerts
|

A W-band stacked FET power amplifier with 17 dBm P<inf>sat</inf> in 45-nm SOI MOS

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2013
2013
2021
2021

Publication Types

Select...
3
2
1

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(2 citation statements)
references
References 5 publications
0
2
0
Order By: Relevance
“…Low resistivity of substrate, low breakdown voltage of transistor, serious parasitic effect and skin effect in millimeter wave band make it a challenge to realize high output power PA based on advanced CMOS technology [8,9,10,11]. In recent years, varieties of researches focus on improving the output power by series or parallel power combining technique [12,13,14,15,16,17,18,19,20,21,22,23].…”
Section: Introductionmentioning
confidence: 99%
“…Low resistivity of substrate, low breakdown voltage of transistor, serious parasitic effect and skin effect in millimeter wave band make it a challenge to realize high output power PA based on advanced CMOS technology [8,9,10,11]. In recent years, varieties of researches focus on improving the output power by series or parallel power combining technique [12,13,14,15,16,17,18,19,20,21,22,23].…”
Section: Introductionmentioning
confidence: 99%
“…However, insertion loss (IL) of the PA's output combining network, itself a pivotal if not the most critical part for this class-A PA design, has not been thoroughly investigated. Therefore, we intend to focus on the specific task of analysing the output combining network's IL in this paper, which will be useful in the design of other millimetre-wave CMOS PAs [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%