A virtual lateral standard for AFM calibration

Koops, Richard; Veghel, Marijn van; Nes, Arthur van de

doi:10.1016/j.mee.2016.01.010

Cited by 6 publications

(3 citation statements)

References 9 publications

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“…At VSL the Veeco Dimension 3100 was used for this investigation. Due to the fact that the measuring range was larger than 100 nm, the instrument was calibrated in the Z-axis with step height standards leading to and not using virtual standards [38]. The calibration of the lateral scales was considered of minor importance since the required measurands only depend on the Z-values, so nominal calibration coefficients were used for the lateral scale.…”

Section: Vsl Afmmentioning

confidence: 99%

AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires

Ribotta,

Delvallée,

Cara

et al. 2024

Meas. Sci. Technol.

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Silicon nanowires (NWs) with a cylindrical form are fabricated by means of nanospheres lithography and metal-assisted chemical etching to obtain high aspect ratio nanostructures (diameter of about 100 nm and length of more than 15 µm) on cm2 area.The nanodimensional characterization of individual NWs is performed by using several techniques, because dimensions at the nanoscale strictly relate to functional performances. In this study, we report the results of an interlaboratory comparison between measurements from a metrological atomic force microscope (AFM) and research AFMs located in different national metrology institutes (NMIs) across Europe and in a university.The purpose of this study is to characterize two measurands: (i) sidewall roughness (Ra, Rq, Rz, Rsk, Rku parameters), extracted from the top profile measured along the nanowire length, and (ii) diameter of the nanowires measured as top-height. To this goal, the nanowires are spread horizontally on a silicon substrate, which has several areas labelled with a pattern of crosses and letters facilitating the measurement of the same NW, in order to study the reproducibility due to different instruments.Measurements show a good agreement between the different NMIs, with a combined standard uncertainty of top-height diameter less than 3%, and with a combined standard uncertainty of roughness parameters well within 5% for Ra and Rq values.

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Section: Vsl Afmmentioning

confidence: 99%

AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires

Ribotta,

Delvallée,

Cara

et al. 2024

Meas. Sci. Technol.

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“…This set-up is most appropriate to calibrate stand-alone probes or surface topography measuring instruments such as roughness and roundness testers. Where the system depicted in Figure 11 has a rather macroscopic size and is less appropriate for e.g., AFM calibrations, miniaturized versions have been developed for AFM vertical [67] and lateral [68] calibrations. A portable system with integrated reference laser interferometer was developed by Pisani [69] as well as by Liang [70].…”

Section: Dynamic Calibration Platformsmentioning

confidence: 99%

The Calibration of Displacement Sensors

Haitjema

2020

Sensors

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Displacement measuring sensors play an essential role in all aspects of dimensional metrology. They can be used for direct displacement measurements but more often they are part of a measurement system, such as an atomic force microscope, roughness tester or a coordinate measuring machine (CMM). In order to achieve traceable measurements that can be related to the meter, these sensors must be calibrated against a reference standard that is more noise- and error-free than the sensor under test. A description of the various methods to achieve the ultimate traceability, repeatability and accuracy of such a calibration system is the main part of this paper. Various interferometric methods will be reviewed including several methods that use directly a primary standard as a reference: either an iodine-stabilized laser or a frequency comb. It is shown that various methods exist to quantify or mitigate the periodic errors that are inherent to interferometric methods. Also it is shown that knowledge of this periodicity may lead to a separation of periodic and non-periodic non-linearity errors of both the calibration instrument as the sensor under test. This review is limited to small-range sensors, typically with a range <100 μm. It is concluded that today’s technology enables sound and traceable sensor calibration up to the sub-nano and even picometer level of uncertainties

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“…An alternative approach that has been considered is the development of active calibration samples where a displacement is generated to perturb the microscope tip by a known distance. This can be achieved using a calibrated piezo electric actuator [14]. Another method applied to fabricate reference structures, is the technology of micro-electromechanical systems (MEMS) technology.…”

Section: Introductionmentioning

confidence: 99%

MEMS displacement generator for atomic force microscopy metrology

Babij

Majstrzyk

Sierakowski

et al. 2021

Meas. Sci. Technol.

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Atomic force microscopy enables three-dimensional high-resolution imaging of surfaces with nanoscale features. In order to obtain the quantitative information about surface geometry, the atomic force microscope’s scanning system must be calibrated. This is usually done by using calibration samples of known and/or defined shape based on either lithographic or crystal structures. In this work we report on a microelectromechanical device, referred to as a displacement generator, whose vertical deflection is controlled electronically. The designed, fabricated and applied device is formed out of a silicon nitride doubly clamped lever, referred to as a microbridge, with a deposited pair of platinum strips. When the MEMS displacement generator is immersed in a magnetic field and when it is electrically biased, the associated Lorentz force induces a structural displacement. In the presented design, the silicon nitride microbridges were fabricated on a (110) silicon wafer in a Wheatstone bridge configuration. A second reference cantilever was mechanically supported by the silicon substrate. In this way, a highly symmetrical structure was fabricated, making it possible to control precisely deflection in Z direction with sub-nanometre precision. The cantilever’s high resonance frequency, of ca. 500 kHz, makes the constructed device insensitive to external vibration sources which are typically at much lower frequencies. As the stage function can be described using the simple harmonic oscillator model, it is clear that the system can operate with sub-nanometre resolution, which, for the purpose of microscope calibration, is extremely beneficial. By placing of the atomic force microscope tip on the actuated reference device it is possible to determine the response of the system over a wide frequency bandwidth. In this work we will describe the fabrication process of the MEMS displacement generator, interferometric and traceable investigations of thermomechanical and electromagnetic actuation schemes. Moreover, we will present the results of the calibration of an atomic force microscope operating in contact and intermittent contact modes.

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A virtual lateral standard for AFM calibration

Cited by 6 publications

References 9 publications

AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires

AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires

The Calibration of Displacement Sensors

MEMS displacement generator for atomic force microscopy metrology

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