1998
DOI: 10.1063/1.120765
|View full text |Cite
|
Sign up to set email alerts
|

A universal damage induced technique for quantum well intermixing

Abstract: We report a novel technique for quantum well intermixing which is simple, reliable and low cost, and appears universally applicable to a wide range of material systems. The technique involves the deposition of a thin layer of sputtered SiO2 and a subsequent high temperature anneal. The deposition process appears to generate point defects at the sample surface, leading to an enhanced intermixing rate and a commensurate reduction in the required anneal temperature. Using appropriate masking it is possible to com… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
42
0

Year Published

2005
2005
2016
2016

Publication Types

Select...
6
2
1

Relationship

1
8

Authors

Journals

citations
Cited by 113 publications
(44 citation statements)
references
References 6 publications
2
42
0
Order By: Relevance
“…Following development, the pattern was transferred to the underlying 500-nm-thick SiO layer through reactive ion etching in a CHF plasma and the UV3 resist was subsequently removed in an O plasma. Disordering of the superlattice relied upon point defect generation through sputtered-silica deposition [19]. In the areas protected by the 500-nm-thick PECVD SiO layer the disordering process was suppressed while those areas exposed to sputtered silica were disordered.…”
Section: Photoluminescence Measurements and Quantum-well Intermixingmentioning
confidence: 99%
“…Following development, the pattern was transferred to the underlying 500-nm-thick SiO layer through reactive ion etching in a CHF plasma and the UV3 resist was subsequently removed in an O plasma. Disordering of the superlattice relied upon point defect generation through sputtered-silica deposition [19]. In the areas protected by the 500-nm-thick PECVD SiO layer the disordering process was suppressed while those areas exposed to sputtered silica were disordered.…”
Section: Photoluminescence Measurements and Quantum-well Intermixingmentioning
confidence: 99%
“…In this paper, Bragg coupling measurements were performed for both TE-and TM-polarised modes in a slab waveguide containing a 600 nm 14:14 monolayer GaAs/AlAs superlattice core both asgrown and after QWI at wavelengths centered around 830 nm and 1520 nm. The QWI technique used in this paper was the sputtered silica method [17]. The QPM average refractive index is taken to be the simple average of the as-grown and QWI values, which are themselves obtained by quadratic fits to the measured data in each of the wavelength bands.…”
Section: Theorymentioning
confidence: 99%
“…Such effects have already been discussed in Ref. 21. We believe the defects created during the annealing process are responsible for the increase in α i in the annealed devices.…”
Section: Wavelength (Nm)mentioning
confidence: 65%