A two-dimensional modelling study of a coaxial plasma waveguide

Rahimi, Sara; Jimenez-Diaz, M.; Hübner, S Simon; Ke­man­eci, Efe; Mullen, J.J.A.M. van der; Dijk, Jan van

doi:10.1088/0022-3727/47/12/125204

Cited by 20 publications

(36 citation statements)

References 47 publications

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“…Figure presents the electron density (a) and temperature (b) and the gas temperature (c) calculated by both models for an applied power of 50–200 W at a pressure of 1000 Pa and flow rate of 125 sccm. Figure (a) shows the linear dependence of the electron density on applied power, in agreement with theoretical and experimental studies previously reported …”

Section: Resultssupporting

confidence: 91%

“…The density of the molecular ions Ar 2 + exhibits maximum values close to the tube wall and at the plasma column ends, that is, where T g is low. Analysis of the reaction rates for formation and loss of the molecular ion shows that high T g reduces the population of the molecular ion . The maximum calculated value is 1.2 × 10 17 and 0.8 × 10 17 m −3 in the QN and PS model, respectively.…”

Section: Resultsmentioning

confidence: 89%

“…This model will be referred to as quasi‐neutral (QN) model further in the text. It is developed in the modeling framework PLASIMO . The second model considers the formation of the sheath next to the tube wall, and hence it is referred to as plasma bulk‐sheath (PS) model below.…”

Section: Experimental Set‐up and The Computational Domainmentioning

confidence: 99%

“…and , presenting specific applications, Refs. and , presenting analytical or modeling research, and Refs . and, presenting experimental or combined theoretical and experimental research).…”

Section: Introductionmentioning

confidence: 99%

“…Despite its limitations, the ambipolar approximation has been successfully applied in intermediate pressure regimes . A model that resolves the space‐charge sheath region has also been developed, however, it considers only the radial description, that is, 1D model .…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments

Georgieva

Berthelot

Silva

et al. 2016

Plasma Processes & Polymers

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An Ar plasma sustained by a surfaguide wave launcher is investigated at intermediate pressure (200–2667 Pa). Two 2D self‐consistent models (quasi‐neutral and plasma bulk‐sheath) are developed and benchmarked. The complete set of electromagnetic and fluid equations and the boundary conditions are presented. The transformation of fluid equations from a local reference frame, that is, moving with plasma or when the gas flow is zero, to a laboratory reference frame, that is, accounting for the gas flow, is discussed. The pressure range is extended down to 80 Pa by experimental measurements. The electron temperature decreases with pressure. The electron density depends linearly on power, and changes its behavior with pressure depending on the product of pressure and radial plasma size.

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Section: Resultssupporting

confidence: 91%

Section: Resultsmentioning

confidence: 89%

Section: Experimental Set‐up and The Computational Domainmentioning

confidence: 99%

“…and , presenting specific applications, Refs. and , presenting analytical or modeling research, and Refs . and, presenting experimental or combined theoretical and experimental research).…”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments

Georgieva

Berthelot

Silva

et al. 2016

Plasma Processes & Polymers

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Plasma propulsion modeling with particle-based algorithms

Taccogna,

Cichocki,

Eremin

et al. 2023

Journal of Applied Physics

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This Perspective paper deals with an overview of particle-in-cell/Monte Carlo collision models applied to different plasma-propulsion configurations and scenarios, from electrostatic (E×B and pulsed arc) devices to electromagnetic (RF inductive, helicon, electron cyclotron resonance) thrusters, as well as plasma plumes and their interaction with the satellite. The most important items related to the modeling of plasma–wall interaction are also presented. Finally, the paper reports new progress in the particle-in-cell computational methodology, in particular, regarding accelerating computational techniques for multi-dimensional simulations and plasma chemistry Monte Carlo modules for molecular and alternative propellants.

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A global plasma and surface model of hydrogen/methane inductively coupled discharge to analyze hydrocarbon plasma–surface interactions in extreme-ultraviolet lithography machines

Kemaneci,

von Keudell,

Heijmans

et al. 2024

Journal of Applied Physics

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Hydrocarbon contamination is associated with light transmission losses in modern lithography machines, which contain extreme-ultraviolet-induced plasma. A volume-averaged global and deposition/etch surface model of a reference hydrogen/methane inductive discharge is developed to investigate the plasma–surface interactions. The simulation results are validated against a wide variety of experiments and verified with respect to multiple sets of computational data. The deposition rate is calculated for a variation in methane impurity (10–10 000 ppm), power, pressure, and net mass flow. The simulations conclude that the hydrocarbon plasma deposition can be minimized by reducing methane impurity and excluding solid organic structures.

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A two-dimensional modelling study of a coaxial plasma waveguide

Cited by 20 publications

References 47 publications

Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments

Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments

Plasma propulsion modeling with particle-based algorithms

A global plasma and surface model of hydrogen/methane inductively coupled discharge to analyze hydrocarbon plasma–surface interactions in extreme-ultraviolet lithography machines

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