Abstract:A three‐dimensional photoresist shape simulator has been developed for the submicron process. Using this simulator, it is possible to analyze and optimize the photoresist process using an arbitrary projector, photoresist, and developer. In this technique, considering the man‐machine interface, the three‐dimensional shape of the photoresist can be shown in a colorgraphic VDT and plotter. Comparing the result of the threedimensional simulation using the contact hole pattern with that of the two‐dimensional simul… Show more
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