2022
DOI: 10.1038/s41598-022-07323-z
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A synchrotron-based kilowatt-level radiation source for EUV lithography

Abstract: A compact damping ring with a limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the storage ring is modulated by a 257 nm wavelength seed laser with the help of the angular-dispersion-induced micro-bunching method (Feng and Zhao in Sci Rep 7:4724, 2017), coherent radiation at 13.5 nm with an average power of about 2.5 kW can be achieved with the state-of-the-art accelerator and laser technologies.

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Cited by 12 publications
(6 citation statements)
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“…Extreme ultraviolet lithography, which can significantly enhance the manufacturing process of high-end chips, is a new technique that promotes the reduction in critical dimensions in lithography to the 7 nm node and beyond. In comparison to other schemes [1][2][3][4][5][6], the LPP (laser-produced plasma) scheme [7] involves irradiating the target with a highenergy laser pulse to generate a high-temperature, high-density plasma, from which EUV light is subsequently emitted through de-excitation processes [8,9]. Being characterized by high conversion efficiency, controllable debris, small light-source size, stability and cleanliness [10], LPP represents the sole solution currently available for high-volume manufacturing (HVM) lithography machines.…”
Section: Introductionmentioning
confidence: 97%
“…Extreme ultraviolet lithography, which can significantly enhance the manufacturing process of high-end chips, is a new technique that promotes the reduction in critical dimensions in lithography to the 7 nm node and beyond. In comparison to other schemes [1][2][3][4][5][6], the LPP (laser-produced plasma) scheme [7] involves irradiating the target with a highenergy laser pulse to generate a high-temperature, high-density plasma, from which EUV light is subsequently emitted through de-excitation processes [8,9]. Being characterized by high conversion efficiency, controllable debris, small light-source size, stability and cleanliness [10], LPP represents the sole solution currently available for high-volume manufacturing (HVM) lithography machines.…”
Section: Introductionmentioning
confidence: 97%
“…Note that after a modulation, the next modulation cannot be performed immediately due to the reduced beam quality. Therefore, the repetition rate of the proposed method (and other similar methods) is limited by the recovery time of the beam quality compared to the steady-state microbunching (SSMB) 29 , 30 or the reversible modulation method 20 . However, there is no suitable method to implement the SSMB and the reversible modulation method in a normal DLSR.…”
Section: Introductionmentioning
confidence: 99%
“…In this paper, we propose a novel method that combines angular dispersion-induced microbunching (ADM) [18][19][20][21] and a few-cycle laser to generate attosecond pulses in a DLSR. The ADM method takes advantage of the low emittance in the vertical direction of the storage ring, which can achieve microbunching in a single modulation and can be implemented in a straight section.…”
mentioning
confidence: 99%
“…The angular dispersion-induced microbunching (ADM) scheme has been proposed to generate fully coherent ultra-short wavelength radiation pulses at a storage ring light source [1,20]- [22]. And a variant of the ADM scheme, called oblique incidence seed laser (OISL) also has been studied [23,24].…”
Section: Introductionmentioning
confidence: 99%