A simple alternative was studied for the tri‐layer resist system. One single thick layer of resist polymer was surface silylated to obtain a bilevel structure that functioned similarly to the bilayer resist composed of the Si‐containing top imaging and the bottom planalizing layers. A resist or matrix polymer layer containing phenolic – OH groups was silylated by exposing it to hexamethyldisilazane vapor, and Si atoms were effectively incorporated in the surface sublayer by limited gas permeation and…
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