2015
DOI: 10.1016/j.sna.2015.03.008
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A surface micromachined pressure sensor based on polysilicon nanofilm piezoresistors

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Cited by 21 publications
(6 citation statements)
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“…Considering the diaphragm size, the sensitivity is higher than the previous surface micromachined pressure sensors [7]- [9]. For the circular diaphragm, the diaphragm area is 78% smaller than the rectangular diaphragm, but the sensitivity is 23.6% larger.…”
Section: Resultsmentioning
confidence: 74%
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“…Considering the diaphragm size, the sensitivity is higher than the previous surface micromachined pressure sensors [7]- [9]. For the circular diaphragm, the diaphragm area is 78% smaller than the rectangular diaphragm, but the sensitivity is 23.6% larger.…”
Section: Resultsmentioning
confidence: 74%
“…They also have the problem of wafer-to-wafer bonding for a sealed cavity, which requires an additional bonding area. Owing to these problems of bulk micromachined pressure sensors, surface micromachined pressure sensors have recently been developed [7]- [9]. A surface micromachined pressure sensor uses polysilicon as a sensing piezoresistor and surface sealed cavity fabricated on a substrate.…”
Section: Introductionmentioning
confidence: 99%
“…With the booming of control science and intelligent monitoring technology, the pressure sensor technology in extreme environments such as engines and oil drilling has received extensive attention from scholars [ 1 , 2 ]. Compared with capacitive, optical fiber, surface acoustic wave, and other types of sensors, piezoresistive pressure sensors have the advantages of the easiness of design configuration, small size, simple processing technology, and the wider linearity range [ 3 , 4 , 5 ]. Owing to the excellent piezoresistive effect of silicon (Si) and mature Si-based micro-electromechanical system (MEMS) processing technology, pressure sensors based on the Si-piezoresistive effect are currently the most commonly used.…”
Section: Introductionmentioning
confidence: 99%
“…The piezoresistive pressure sensors were first demonstrated by Tufte et al in the 1960s [1] by using KOH etching. They may be made by bulk micromachining [2,3] or surface micromachining [4,5]. Also, wide-band gap semiconductors based piezoresistive pressure sensors have been proposed for hostile environments [6,7].…”
Section: Introductionmentioning
confidence: 99%