A surface adsorption model for electroless cobalt alloy thin films

Electroless cobalt deposition from a glycinate solution using morpholine borane as a reducing agent

“…Cobalt alloys with low soluble dopants form structures that may be used as diffusion barriers and capping layers preventing contamination by copper. [2][3][4][5] Electroless cobalt baths that use hypophosphite ions as a reducing agent can deposit coatings containing 4-8 at.% of phosphorus. 5 Boron containing compounds (sodium and potassium borohydrides NaBH 4 and KBH 4 or borazanes R x NH y BH xzy , where R is an organic group such as methyl or ethyl) are stronger reducing agents as compared to hypophosphites.…”

“…[2][3][4][5] Electroless cobalt baths that use hypophosphite ions as a reducing agent can deposit coatings containing 4-8 at.% of phosphorus. 5 Boron containing compounds (sodium and potassium borohydrides NaBH 4 and KBH 4 or borazanes R x NH y BH xzy , where R is an organic group such as methyl or ethyl) are stronger reducing agents as compared to hypophosphites. 6 Co (and Ni) thin electrolessly deposited films with boron have higher hardness, better corrosion resistance compared to those of Co (or Ni) films codeposited with phosphorus.…”

“…Due to the self-activated process highly selective Co-based films can be directly formed on Cu. 4,10 Mixing of both the reducing agents, sodium hypophosphite and DMAB, in the metal-ligand solution yielded a self-activated deposition which was impossible in solutions containing only hypophosphite as a reducer. 4 It was established that the boron content in the alloys is greatly influenced by the complexing agent employed.…”

“…4,10 Mixing of both the reducing agents, sodium hypophosphite and DMAB, in the metal-ligand solution yielded a self-activated deposition which was impossible in solutions containing only hypophosphite as a reducer. 4 It was established that the boron content in the alloys is greatly influenced by the complexing agent employed. A strong complexing agent diminished the deposition rate of the film and gave rise to a higher boron content, leading to an amorphous structure.…”

“…11 Sodium citrate is a commonly used complexing agent in cobalt and nickel deposition baths with DMAB. 2,4,[8][9][10][11][12][13] Other agents such as tartrate, malonate, 7,11 acetate and NH 4 OH 6,14 were also used for electroless cobalt deposition with reducing agents containing boron.…”