A Study on the Piezoelectric Characteristic of P(VDF-TrFE) Copolymer Thin Film by Physical Vapor Deposition Method

Park, S.H.

doi:10.5757/jkvs.2008.17.3.220

Cited by 2 publications

(1 citation statement)

References 4 publications

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“…Figure 3 shows the Fourier transform infrared spectroscopy (Hyperion 3000, Bruker) results of spin coated film (SC) and detach-and-transferred film (DT) in the range of 600 cm −1 to 1700 cm −1 . To analyze the spectroscopic data, the main characteristic peaks of P(VDF-TrFE) are included in Table 2 [17], [18]. The ferroelectric phase (β) is shown to exist given the peaks at 1273 cm −1 , 880 cm −1 , and 841 cm −1 .…”

Section: Detach-and-transfer Methodsmentioning

confidence: 99%

Fabrication and Characterization of Ferroelectric Poly(Vinylidene Fluoride-Trifluoroethylene) (P(VDF-TrFE)) Thin Film on Flexible Substrate by Detach-and-Transferring

Kim

Lee

2012

IEICE Trans. Electron.

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In this paper, a 60 nm-thick ferroelectric film of poly(vinylidene fluoride-trifluoroethylene) on a flexible substrate of aluminum foil was fabricated and characterized. Compared to pristine silicon wafer, Al-foil has very large root-mean-square (RMS) roughness, thus presenting challenges for the fabrication of flat and uniform electronic devices on such a rough substrate. In particular, RMS roughness affects the leakage current of dielectrics, the uniformity of devices, and the switching time in ferroelectrics. To avoid these kinds of problems, a new thin film fabrication method adopting a detach-and-transfer technique has been developed. Here, 'detach' means that the ferroelectric film is detached from a flat substrate (sacrificial substrate), and 'transfer' refers to the process of the detached film being moved onto the rough substrate (main substrate). To characterize the dielectric property of the transferred film, polarization and voltage relationships were measured, and the results showed that a hysteresis loop could be obtained with low leakage current.

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Section: Detach-and-transfer Methodsmentioning

confidence: 99%