2008
DOI: 10.1088/0953-8984/20/21/215229
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A study of uranium-based multilayers: I. Fabrication and structural characterization

Abstract: This paper addresses the structural characterisation of a series of U/Fe, U/Co and U/Gd multilayers. X-ray reflectivity has been employed to investigate the layer thickness and roughness parameters along the growth direction and highangle diffraction measurements have been used to determine the crystal structure and orientation of the layers. For the case of uranium/transition metal systems, the interfaces are diffuse (∼ 17Å) and the transition metals are present in a polycrystalline form of their common bulk … Show more

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Cited by 8 publications
(16 citation statements)
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“…Uranium is a light actinide with itinerant 5f electrons. This property can be exploited in various configurations such as magnetic multilayer systems [21][22][23][24][25]. The SHE of U was experimentally reported [26] and was found to be surprisingly low.…”
Section: Introductionmentioning
confidence: 94%
“…Uranium is a light actinide with itinerant 5f electrons. This property can be exploited in various configurations such as magnetic multilayer systems [21][22][23][24][25]. The SHE of U was experimentally reported [26] and was found to be surprisingly low.…”
Section: Introductionmentioning
confidence: 94%
“…However, recent modifications to the fabrication procedure have included the introduction of Nb buffer and capping layers and the use of sapphire substrates, which has improved the multilayer quality. Paper I in this series of articles [8] describes the fabrication and structural characterization of U/Fe, U/Co and U/Gd multilayers in detail. The U/TM (TM = transition metal, Fe, Co) systems showed similar growth characteristics to polycrystalline TM and U layers and a critical thickness for crystallinity of ∼20 Å for the TM layers.…”
Section: Introductionmentioning
confidence: 99%
“…Thin layers of permalloy (Py; Ni80Fe20) and bilayers of permalloy/uranium (Py/U) were deposited using a dedicated actinide sputter deposition chamber [19]. DC magnetron sputtering was employed to synthesize samples with thicknesses, tPy and tU of 12.5 nm and 3 nm, respectively.…”
mentioning
confidence: 99%