1997
DOI: 10.1016/s0013-4686(96)00375-1
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A study of thin anodic WO3 films by electrochemical impedance spectroscopy

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1997
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Cited by 58 publications
(31 citation statements)
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“…This behaviour, which is similar to the one previously reported 14,15 for thin WO3 films anodically grown on tungsten in several electrolytes, can be partially due to a higher contribution from the surface states on decreasing the film thickness. However, an influence of the thickness on the ND value as a consequence of a higher defect concentration in thin films cannot be excluded.…”
Section: Electrochemical Impedance Datasupporting
confidence: 90%
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“…This behaviour, which is similar to the one previously reported 14,15 for thin WO3 films anodically grown on tungsten in several electrolytes, can be partially due to a higher contribution from the surface states on decreasing the film thickness. However, an influence of the thickness on the ND value as a consequence of a higher defect concentration in thin films cannot be excluded.…”
Section: Electrochemical Impedance Datasupporting
confidence: 90%
“…As pointed out previously 15 , this happens because the faradaic reaction decreases sharply for fields lower than the film formation field. Thus, from impedance spectra obtained at E < Ef , the values of C decrease with increasing E (see Fig.…”
Section: Electrochemical Impedance Datamentioning
confidence: 52%
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