A study of the oxidation behavior of CrN and CrZrN ceramic thin films prepared in a magnetron sputtering system

Khamseh, Sara; Araghi, Hessamaddin Younesi

doi:10.1016/j.ceramint.2016.03.101

Cited by 22 publications

(11 citation statements)

References 19 publications

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“…The deposited hard film, as the name implies, must have a higher value of mechanical properties such as hardness, wear resistance and tribological properties. The mechanical, wear and tribological properties of the film are affected by the phases and orientations of the films as reported in the literature [38,44]. So the study of the preferred orientation of the CrN thin films is also important from an application point of view.…”

Section: Effect Of Substrate Materials (In Terms Of Xrd and Surface Amentioning

confidence: 94%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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Section: Effect Of Substrate Materials (In Terms Of Xrd and Surface Amentioning

confidence: 94%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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“…Among the existing options for a third chemical element, zirconium addition shows great promise, seeing that this element has been used in other systems. KHAMSEH e ARAGHI [20] reported the increase of oxidation temperature from 873 K to 1073 K for CrZrN (0.4 at.%) thin films while maintaining an elevated hardness.…”

Section: Introductionmentioning

confidence: 99%

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

et al. 2021

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Ta 1-x Zr x N thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta 1-x Zr x N thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta 1-x Zr x N coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.

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“…However, further research has been devoted to the development of ternary systems to meet the harsh criteria of a fastchanging industry. Especially in an attempt to improve the hardness, friction resistance, and oxidation-resistance of CrN, the incorporation of elements such as Zr, Al, or Si into a Cr-N coating has been actively introduced [4][5][6][7][8][9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

“…Among the Cr-based ternary transition-metal nitrides, CrZrN coatings provide quite unique characteristics relative to CrN [4,6,8,9]. Kim et al [4] reported that the maximum hardness of CrZrN with an increase of up to 12.1 at.% of Zr content reached 34 GPa, as well as the tribological properties from the ball-on-disc wear test, which revealed no film failure compared to CrN.…”

Section: Introductionmentioning

confidence: 99%

Structural and Thermal Stability of CrZrON Coatings Synthesized via Reactive Magnetron Sputtering

Kim

Lee

2023

Coatings

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This research manuscript investigates the structural and thermal stability of CrZrON coatings synthesized through reactive magnetron sputtering. The coatings were deposited at different temperatures with 120 °C and 400 °C, and with varying oxygen-to-reactive gas ratios in the range of 8.3% to 25.7%. The average chemical composition, crystallographic orientation, microstructure, lattice parameter, crystallite size, and hardness of the coatings were evaluated. The results revealed that the coatings deposited at a lower temperature of 120 °C exhibited a columnar structure, while those deposited at a higher temperature of 400 °C showed a transition towards a featureless or amorphous structure. The lattice parameter and crystallite size were influenced by the deposition temperature and oxygen ratio, indicating the incorporation of oxygen into the coatings. Hardness measurements demonstrated that the coatings’ hardness decreased from 33.7 GPa to 28.6 GPa for a process temperature of 120 °C and from 32.1 GPa to 25.7 GPa for 400 °C with an increase in the oxygen ratio, primarily due to the formation of oxygen-rich compounds or oxides. Additionally, annealing experiments indicated that the coatings with featureless or amorphous structures exhibited improved thermal stability, as they maintained their structural integrity without delamination even at high annealing temperatures.

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A study of the oxidation behavior of CrN and CrZrN ceramic thin films prepared in a magnetron sputtering system

Cited by 22 publications

References 19 publications

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Structural and Thermal Stability of CrZrON Coatings Synthesized via Reactive Magnetron Sputtering

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