A study of the macroparticle distribution in cathodic-arc-evaporated TiN films

Baouchi, A.Wahab; Perry, A.J.

doi:10.1016/0257-8972(91)90064-4

Cited by 66 publications

(16 citation statements)

References 18 publications

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“…The dense plasma in front of the cathode spots generates a high pressure, which exceeds atmospheric pressure by orders of magnitude (0.5 GPa) 31 . The high pressure induces splashes of the molten liquid and macroparticles forms, some of which emit towards the substrate and are embedded in the coatings, while others are redeposited in the vicinity of the crater 32 .…”

Section: Discussionmentioning

confidence: 99%

Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation

Zhu¹,

Eriksson²,

Ghafoor³

et al. 2010

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The microstructural evolution of Ti 1-x Si x cathode surfaces (x=0, 0.1, 0.2) used in reactive cathodic arc evaporation has been investigated by analytical electron microscopy and x-ray diffractometry. The results show that the reactive arc operated in N 2 atmosphere induces a 2-12 μm thick N-containing converted layer consisting of nanosized grains in the two-phase Ti and Ti 5 Si 3 cathode surface. The formation mechanism of this layer is proposed to be surface nitriding and redeposition of macroparticles formed during the deposition process. The surface roughness of the worn Ti 1-x Si x cathodes increases with increasing Si content, up to 20 at%, due to preferential erosion of Ti 5 Si 3 .

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Section: Discussionmentioning

confidence: 99%

Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation

Zhu¹,

Eriksson²,

Ghafoor³

et al. 2010

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…The macroparticle density is 3.5 Â 10 3 mm À2 , with average and maximum particle sizes of 0.67 mm and 4.2 mm, respectively. This macroparticle density is 4-8Â lower than values typically reported for coatings prepared by conventional cathodic arc, while the maximum particle size is in the range of 2-16Â smaller [32,33]. Reducing the size and density of macroparticles is important as the presence of macroparticles deteriorates both corrosion protection and coating performance.…”

Section: Resultsmentioning

confidence: 74%

CrN, CrN/SiC, and CrN/DLC Coatings Deposited by a Novel Arc Plasma Acceleration Process: Processing and Properties

Mulligan

Senick

Schmidt

et al. 2014

Materials and Manufacturing Processes

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CrN monolayers along with CrN/SiC and CrN/diamond-like carbon (DLC) duplex layers were deposited by arc plasma acceleration on 4340 steel substrates. The layers exhibit a dense microstructure with a low density of surface defects and macroparticles. The tribological properties were evaluated with dry ball-on-disk sliding tests against an alumina counterface at room temperature. The CrN monolayer exhibits a coefficient of friction, m ¼ 0.28 AE 0.02, while CrN/SiC and CrN/DLC duplex layers both demonstrate much lower m ¼ 0.07 AE 0.01. The wear rates of the coatings were very low and measured as 0.53, 0.73, and 0.79 mm 3 /Nm, respectively, for CrN, CrN/DLC, and CrN/SiC. Corrosion resistance was evaluated in both cyclical environmental testing as well as quantitatively via electrochemical impedance spectroscopy. The corrosion resistance in both cases is compared to standard electroless Ni and electroplated Cr coatings. The highest level of corrosion resistance was observed for the CrN monolayer and CrN/SiC duplex layer. Both exhibit improved corrosion resistance over electroless Ni and electroplated Cr coatings. This high level of corrosion resistance is remarkable for physical vapor deposited thin nitride layers. The arc plasma acceleration deposited materials show great promise for applications in which a combination of low friction, wear resistance, and corrosion resistance are required.

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“…[15][16][17] However, the effect of magnetic field was generally neglected. In this work, the effect of TMF on the MPs reduction is much more obvious than those of pulsed bias, gas pressure, and substrate position, which is attributed to the elevation of the velocity of the arc spot movement and reduction of the residence time of the arc spot by the magnetic field, leading to the shrinking of the liquid pool area under the arc spot and inhibiting the formation of MPs.…”

Section: Resultsmentioning

confidence: 99%

Investigation on Behavior of Macro-Particles in TiN Film by Arc Ion Plating

Lang¹,

Gao²,

Du³

et al. 2015

j nanosci nanotechnol

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Macroparticle contamination deteriorates the qualities and performances of protective coatings by arc ion plating, resulting in a limitation in their applications. In this work, the effects of transverse magnetic field (TMF), pulsed bias, gas pressure, and substrate position on behavior of the macro-particles (MPs) in TiN films are quantitatively investigated. It is demonstrated that the key factor of the deposition process on the MPs behavior is magnetic field, which controls the movement of arc spot significantly. At relatively low magnetic field intensity, the MPs behavior is greatly influenced by the other three process parameters. The sensibilities of the three parameters on MPs behavior are decreased with the increasing magnetic field intensity. At high magnetic field intensity, the MPs distribution keeps almost the same even when the other parameters are varied.

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A study of the macroparticle distribution in cathodic-arc-evaporated TiN films

Cited by 66 publications

References 18 publications

Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation

Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporation

CrN, CrN/SiC, and CrN/DLC Coatings Deposited by a Novel Arc Plasma Acceleration Process: Processing and Properties

Investigation on Behavior of Macro-Particles in TiN Film by Arc Ion Plating

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