A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition

Vernardou, Dimitra; Paterakis, P.; Drosos, H.; Spanakis, Emmanuel; Povey, Ian M.; Pemble, Martyn E.; Koudoumas, E.; Katsarakis, N.

doi:10.1016/j.solmat.2011.05.046

Cited by 84 publications

(66 citation statements)

References 35 publications

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“…The maximum current density obtained for the as-grown coating at 550 • C (Figure 6) was lower than the colloidal crystal-assisted electrodeposited amorphous three-dimensional ordered macroporous (0.5 mA·cm −2 [4]), sol-gel (0.6 mA·cm −2 [16]), aerosol-assisted CVD (1.5 mA·cm −2 [34]) V 2 O 5 , and was comparable with APCVD (0.01 mA·cm −2 [18]) and hydrothermal growth (0.05 mA·cm −2 [17]) of V 2 O 5 . This value was also lower than the one obtained from the vacuum deposited (0.6 mA·cm −2 [35]) tungsten trioxide (WO 3 ), and comparable with APCVD (0.02 mA·cm −2 [36]), evaporation-induced self-assembly (0.06 mA·cm −2 [37]), low-pressure CVD (0.08 mA·cm −2 [38]), and hydrothermal (0.04 mA·cm −2 [39]) growth WO 3 .…”

Section: Cyclic Voltammetrymentioning

confidence: 93%

“…Hence, a low-cost, simple, and easily integrated into float-glass production lines technique is required. As with many coatings, chemical vapor deposition (CVD) routes are more attractive for the production of vanadium oxides on glass than other conventional techniques, since the stoichiometry and the morphology of the coatings can be simply controlled by tuning the vapor flows in the coating zone [18,19]. In addition, the simplicity of CVD-particularly when performed at atmospheric pressure (APCVD)-makes such a process compatible with on-line glass manufacturing processes.…”

Section: Methodsmentioning

confidence: 99%

“…In addition, the simplicity of CVD-particularly when performed at atmospheric pressure (APCVD)-makes such a process compatible with on-line glass manufacturing processes. Nevertheless, there are very few reports related to APCVD electrochromic V2O5 [18].…”

Section: Methodsmentioning

confidence: 99%

“…The APCVD reactor used in this work is an in-house design, and consists of a cold-wall reactor connected to an arrangement of stainless-steel heated pipes, valves, and bubblers, as shown in Figure 1 [18]. Bubbler 1 was used for the vanadium (IV) chloride, VCl4 (Aldrich, Munich, Germany, 99%), and bubbler 2 for the deionised H2O.…”

Section: Methodsmentioning

confidence: 99%

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Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Vernardou

2017

Coatings

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Vanadium pentoxide coatings were grown by atmospheric pressure chemical vapor deposition varying the gas precursor ratio (vanadium (IV) chloride:water) and the substrate temperature. All samples were characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, cyclic voltammetry, and transmittance measurements. The water flow rate was found to affect the crystallinity and the morphological characteristics of vanadium pentoxide. Dense stacks of long grains of crystalline oxide are formed at the highest amount of water utilized for a substrate temperature of 450 • C. Accordingly, it was indicated that for higher temperatures and a constant gas precursor ratio of 1:7, the surface morphology becomes flattened, and columnar grains of uniform size and shape are indicated, keeping the high crystalline quality of the material. Hence, it was possible to define a frame of operating parameters wherein single-phase vanadium pentoxide may be reliably expected, including a gas precursor ratio of 1:7 with a substrate temperature of >450 • C. The as-grown vanadium pentoxide at 550 • C for a gas precursor ratio of 1:7 presented the best electrochemical performance, including a diffusion coefficient of 9.19 × 10 −11 cm 2 ·s −1 , a charge density of 3.1 mC·cm −2 , and a coloration efficiency of 336 cm 2 ·C −1 . One may then say that this route can be important for the growth of large-scale electrodes with good performance for electrochromic devices.

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Section: Cyclic Voltammetrymentioning

confidence: 93%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Vernardou

2017

Coatings

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“…It is also noteworthy that VO 2 (M) thin films have been deposited using VOCl 3 , a vanadium(V) source. 23,25,26 Thin films of VO 2 (M) have been deposited using both atmospheric pressure chemical vapour deposition (APCVD) [27][28][29][30] and aerosol assisted chemical vapour deposition (AACVD) methods, 11,31,32 both of which are highly effective methods…”

Section: Introductionmentioning

confidence: 99%

[{VOCl₂(CH₂(COOEt)₂)}₄] as a molecular precursor for thermochromic monoclinic VO₂ thin films and nanoparticles

et al. 2016

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The synthesis of thermochromic monoclinic vanadium(IV) oxide (VO 2 (M)) thin films and vanadium oxide nanocrystals from a molecular precursor, [{VOCl 2 (CH 2 (COOEt) 2 )} 4 ] is described. Thin films were synthesised using aerosol assisted chemical vapour deposition (AACVD) onto glass substrates at high temperatures and were subsequently characterised and tested for thermochromic efficiency. The film's suitability as smart, energy efficient window coatings was investigated by calculating their solar modulation potential. Thin films were also doped with tungsten to lower their metal to semiconductor transition temperature (MST) through the addition of tungsten(VI) phenoxide during the AACVD process, lowering the MST from a typical B70 1C for an undoped VO 2 (M) thin film to B50 1C for a typical W-doped example. The optimum deposition temperature of 550 1C produced films with thermochromic properties (solar modulation of 15.9%) comparable to the highest values reported. In addition, vanadium oxide nanostructures were synthesised using the thermal decomposition of [{VOCl 2 (CH 2 (COOEt) 2 )} 4 ] and their shape controllably tailored by varying surfactant concentration and type. Thin films and nanostructures were characterised using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and energy-dispersive X-ray spectroscopy (EDS). Thermochromic measurements were measured using UV-Vis spectroscopy with a variable temperature stage.

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Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

Bahlawane¹,

Lenoble²

2014

Chemical Vapor Deposition

154

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The structure‐driven properties of vanadium oxide have inspired enormous developments in the last decades, especially as a smart material for energy, sensors, and optoelectronics. The large variety of stable and metastable structures of vanadium oxide is discussed, based on the calculated formation energies and a broad overview of their structure‐related properties. The established chemical deposition processes from the gas phase are reviewed with a particular emphasis on the implemented precursors and the obtained vanadium oxide phases. Although a significant fraction of relevant vanadium oxide compounds is achieved by these methods, there are still rewarding challenges related to their controlled elaboration and the investigation of their responsive properties.

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A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition

Cited by 84 publications

References 35 publications

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

[{VOCl₂(CH₂(COOEt)₂)}₄] as a molecular precursor for thermochromic monoclinic VO₂ thin films and nanoparticles

Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

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A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition

Cited by 84 publications

References 35 publications

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

[{VOCl2(CH2(COOEt)2)}4] as a molecular precursor for thermochromic monoclinic VO2 thin films and nanoparticles

Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

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[{VOCl₂(CH₂(COOEt)₂)}₄] as a molecular precursor for thermochromic monoclinic VO₂ thin films and nanoparticles