Atomic layer deposition
(ALD) provides uniform and conformal thin
films that are of interest for a range of applications. To better
understand the properties of amorphous ALD films, we need an improved
understanding of their local atomic structure. Previous work demonstrated
measurement of how the local atomic structure of ALD-grown aluminum
oxide (AlO
x
) evolves in operando during
growth by employing synchrotron high-energy X-ray diffraction (HE-XRD).
In this work, we report on efforts to employ electron diffraction
pair distribution function (ePDF) measurements using more broadly
available transmission electron microscope (TEM) instrumentation to
study the atomic structure of amorphous ALD-AlO
x
. We observe electron beam damage in the ALD-coated samples
during ePDF at ambient temperature and successfully mitigate this
beam damage using ePDF at cryogenic temperatures (cryo-ePDF). We employ
cryo-ePDF and reverse Monte Carlo (RMC) modeling to obtain structural
models of ALD-AlO
x
coatings formed at
a range of deposition temperatures from 150 to 332 °C. From these
model structures, we derive structural metrics including stoichiometry,
pair distances, and coordination environments in the ALD-AlO
x
films as a function of deposition temperature.
The structural variations we observe with growth temperature are consistent
with temperature-dependent changes in the surface hydroxyl density
on the growth surface. The sample preparation and cryo-ePDF procedures
we report here can be used for the routine measurement of ALD-grown
amorphous thin films to improve our understanding of the atomic structure
of these materials, establish structure–property relationships,
and help accelerate the timescale for the application of ALD to address
technological needs.