A Study of Low Energy Phosphorus Implantation and Annealing in Si:C Epitaxial Films

Ye, Zhiyuan; Kim, Yihwan; Zojaji, Ali; Sánchez, E. A.; Cho, Yonah; Castle, M.; Foad, M.A.

doi:10.1109/istdm.2006.246499

2006 International SiGe Technology and Device Meeting 2006

DOI: 10.1109/istdm.2006.246499

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A Study of Low Energy Phosphorus Implantation and Annealing in Si:C Epitaxial Films

Zhiyuan Ye¹,

Yihwan Kim²,

Ali Zojaji³

et al.

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A Study of Low Energy Phosphorus Implantation and Annealing in Si:C Epitaxial Films

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