2007
DOI: 10.1016/j.apsusc.2006.07.072
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A study of fused silica micro/nano patterning by focused-ion-beam

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Cited by 22 publications
(9 citation statements)
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“…, using masks of various kinds). However, here the films described above were engineered into several types of structures by machining lines through the film using the FIB method. Examples of the structures formed are shown in Figure , imaged by AFM (Veeco Multimode with Nanoscope IIIa controller). The fabricated areas only occupy a very small part of the 10 × 10 mm crystal, each being around 30 μm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…, using masks of various kinds). However, here the films described above were engineered into several types of structures by machining lines through the film using the FIB method. Examples of the structures formed are shown in Figure , imaged by AFM (Veeco Multimode with Nanoscope IIIa controller). The fabricated areas only occupy a very small part of the 10 × 10 mm crystal, each being around 30 μm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…However, it needs a mold that is made of ultraviolet transparent material such as quartz. Therefore, fabrication of quartz mold with submicron/ nanoscale structures becomes a critical technology for imprint (Ref 21,22); however, there has been only little study on FIB processing quartz material.…”
Section: Introductionmentioning
confidence: 99%
“…This paper demonstrated that the microand nano-features machined by FIB micro-milling process can replace lithography-based pattern transfer techniques to fabricate Ni-based masters for injection molding and hot embossing. Li et al [97] further investigated machining capacity of FIB micro-milling for micro-and nano-features on fused silica substrates coated with a 15 nm thick Cr layer. Their study indicated that FIB micro-milling could also replace e-beam lithography for fabricating fused silica templates for UV nanoimprinting.…”
Section: Fib-machiningmentioning
confidence: 99%