“…To obtain the tight-binding amplitude a s j of an electron in the complete system we solve a matricial finite system for the scattering region (Fig. 1) and make use of a decimation procedure [12,17,18] which couples exactly the amplitudes at the collector to the ones at the emitter:…”
Section: Mathematical Formalismmentioning
confidence: 99%
“…We obtain a self-consistent solution for charge distribution and potential energy profile in which an onedimensional Green function is used for obtaining the solution of Poisson equation [12]. The charge distribution in the scattering region is mainly composed of extrinsic holes originated by the p-doping in the DMS.…”
Section: Mathematical Formalismmentioning
confidence: 99%
“…In previous works we focused in the spin polarized transport of holes [10][11][12], however the spin relaxation time in quantum wells is approximately 100 ns for electrons and 150 ps for holes at T % 10 K [2,13]. Our device is a heterostructure whose configuration is 40Å À Ga 0:58 Al 0:42 As=93Å À Ga 0:95 Mn 0:05 As= 40ÅÀ Ga 0:58 Al 0:42 As, it is depicted in Fig.…”
“…To obtain the tight-binding amplitude a s j of an electron in the complete system we solve a matricial finite system for the scattering region (Fig. 1) and make use of a decimation procedure [12,17,18] which couples exactly the amplitudes at the collector to the ones at the emitter:…”
Section: Mathematical Formalismmentioning
confidence: 99%
“…We obtain a self-consistent solution for charge distribution and potential energy profile in which an onedimensional Green function is used for obtaining the solution of Poisson equation [12]. The charge distribution in the scattering region is mainly composed of extrinsic holes originated by the p-doping in the DMS.…”
Section: Mathematical Formalismmentioning
confidence: 99%
“…In previous works we focused in the spin polarized transport of holes [10][11][12], however the spin relaxation time in quantum wells is approximately 100 ns for electrons and 150 ps for holes at T % 10 K [2,13]. Our device is a heterostructure whose configuration is 40Å À Ga 0:58 Al 0:42 As=93Å À Ga 0:95 Mn 0:05 As= 40ÅÀ Ga 0:58 Al 0:42 As, it is depicted in Fig.…”
“…Most activities are focused on the Mn-doped III-V or II-VI DMS materials, for which high quality epitaxial films with room temperature ferromagnetism (RT-FM) have been grown [3]. However, since the theoretical prediction of high Curie temperature [4,5] in 5% Mn doped Si, more research interest has been devoted to the realization of ferromagnetism in Mn-doped group IV, owing to their potential compatibility with current Si-based processing technology [6].…”
Substitutionally doped Si1−xMnx thin films were fabricated by a magnetron cosputtering method at a low growth temperature. X-ray absorption fine structure (XAFS) and x-ray diffraction (XRD) techniques were used to investigate the structures of the Si1−xMnx thin films. The XRD results exhibit that no secondary phases such as metallic Mn or Mn–Si compound can be detected. The detailed analysis of the extended XAFS together with the x-ray absorption near-edge structure spectra at the Mn K-edge unambiguously reveals that the doped Mn atoms are incorporated into the Si matrix and substitute for the Si sites in the Si lattice. The results clearly indicate that the Mn occupations in silicon thin films are quite sensitive to the growth conditions and the postannealing treatment.
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