2017
DOI: 10.2494/photopolymer.30.325
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A Spectroscopic Study on Argon-Ammonia Water Gaseous Plasma Super-hydrophilizing Polytetrafluoroethylene

Abstract: In this study, optical emission spectroscopy was used to investigate the advantages of using NH 3 and water with Ar gas plasma. All plasmas in this work were non-thermal plasma with T e higher than T g , especially in N 2 and Ar/NH 3 -H 2 O plasmas, T e , T v , T r and T g were 3.3×10 4 K (ca. 2.5 eV), 7×10 3 K (ca. 0.5 eV), 1×10 3 K, and 3.2×10 2 K, respectively. In the Ar/NH 3 -H 2 O plasma, similar to the Ar/H 2 O plasma, water dissociated readily to form OH and H radicals. On the other hand, in the PTFE su… Show more

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Cited by 7 publications
(10 citation statements)
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“…The best results in terms of the hydrophilic surface finish were reported recently by Nguyen et al [ 34 ]. The WCA dropped from the original 118° down to 4° only.…”
Section: Review Of Recent Papers On Surface Activation Of Polytetrmentioning
confidence: 99%
See 3 more Smart Citations
“…The best results in terms of the hydrophilic surface finish were reported recently by Nguyen et al [ 34 ]. The WCA dropped from the original 118° down to 4° only.…”
Section: Review Of Recent Papers On Surface Activation Of Polytetrmentioning
confidence: 99%
“…Plasma sustained by inductively coupled discharges in glass tubes was characterized by the extremely high dissociation of gaseous molecules [ 35 ]. The flux of H, N and NH radicals on the surface in the reactor adopted by Nguyen et al [ 34 ] is, therefore, considerable. Furthermore, such plasma is a tremendous source of radiation [ 36 ], so the combined effect of UV/VUV radiation causes the rapid depletion of fluorine and substitution with NH x and OH groups.…”
Section: Review Of Recent Papers On Surface Activation Of Polytetrmentioning
confidence: 99%
See 2 more Smart Citations
“…Plasma emission spectra12) : (a) NH3 plasma ; (b) Ar/ H2O plasma, Ar I represents Ar atom ; (c) Ar/NH3-H2O plasma ; (d) Ar/NH3-H2O plasma contacting with PTFE.…”
mentioning
confidence: 99%