A spectroscopic study of active species in DC and HF flowing discharges in - and Ar - - mixtures

Abstract

Optical emission spectroscopy and laser-induced fluorescence (LIF) techniques are used to study the production of active species in DC and HF N 2 -H 2 and N 2 -H 2 -Ar flowing discharges and post-discharges, in connection with plasma reactions for surface treatments. N and H ground state atom relative densities are obtained by two-photon LIF in a N 2 -H 2 flowing DC discharge and in the DC and HF post-discharge regions. The conditions to create maximum density of N and H species are determined in each case in relation to the plasma kinetics. In no case was the NH radical observed in the post-discharge regions, indicating that this radical does not contribute to the nitriding process.

Validity of actinometry to measure N and H atom concentration in N2-H2direct current glow discharges

“…We can see that LIF and line emission intensity are in good agreement in the region 0-90% of H 2 in the mixture, as was presented in [28].…”

Laser induced stimulated emission for hydrogen atom density measurements in a hydrogen pulsed microwave discharge

“…The probability ␥ decreases by nearly one order of magnitude when 1% air is added. This result may be connected with previous measurements, 10 where the H atom density increase was approximately the same in the postdischarge of a surfatron microwave discharge in N 2 -H 2 mixtures. N 2 and O 2 seem to ''poison'' the recombination ability of the surface.…”

Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source

“…As can be noted, the band at 337 nm consists of two components, at 336.4 and 337.3 nm, which are assigned to NH* and N 2 * species, respectively. 24,27,28 The integrated emission intensities from NH* and N 2 * are plotted in Fig. 5 as a function of c N .…”