A simple route to prepare anatase TiO2 film onto polyimide substrate by DC pulsed magnetron sputtering

Liu, Jindong; Zhang, Xin; He, Yi; Chen, Qing; Tian, Aihua; Gan, Shukun; Wang, Haibo; Liu, Yuanbing; Ding, Wanyu

doi:10.1016/j.matchemphys.2020.122678

Cited by 9 publications

(4 citation statements)

References 28 publications

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“…This study reports the generation of TiO 2− x films with DC‐magnetron sputtering using a Ti target. It is known that the structural, morphological, and oxidation properties of the TiO 2− x films during magnetron sputter deposition can be affected by varying process parameters such as sputter power, annealing, and substrate temperature 20,25,33,39,40 . In this study, we found that phase transition is also accelerated by influence of sputter power at 200°C substrate temperature ( T s ).…”

Section: Introductionmentioning

confidence: 67%

“…This technique allows the deposition of oxide compound films by introducing oxygen (O 2 ) gas into the plasma, which is typically formed by an inert gas such as argon (Ar). [33][34][35][36] Besides, the method can easily adjust the deposition parameters and offers a high deposition rate for large-scale production.…”

Section: Introductionmentioning

confidence: 99%

“…However, the direct current (DC) magnetron sputtering method has many advantages such as good control over the composition and structure of the films, extremely high film‐substrate adhesion, excellent uniformity on large‐area substrates, and the ability to coat heat‐sensitive substrates. This technique allows the deposition of oxide compound films by introducing oxygen (O 2 ) gas into the plasma, which is typically formed by an inert gas such as argon (Ar) 33–36 . Besides, the method can easily adjust the deposition parameters and offers a high deposition rate for large‐scale production.…”

Section: Introductionmentioning

confidence: 99%

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Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Jana¹,

Debnath

Bahadur

et al. 2021

Surface & Interface Analysis

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Titanium dioxide (TiO2−x) films were deposited on silicon (100) substrates from pure titanium (Ti) targets using direct current magnetron sputtering technique. TiO2−x thin films were grown in the thickness range of 515–672 Å with varying sputter powers of 75 and 100 W, at both room temperature (RT) and 200°C substrate temperature (Ts). Structural and compositional characterization of the films, which included surface morphology and study of surface chemical states, was performed. The influences of sputter power and substrate temperature on these parameters were specifically analyzed. Grazing incidence X‐ray diffraction showed that the thin films were amorphous at RT and crystallinity could be achieved only at Ts. The latter showed anatase phase at sputter power of 75 W and transformed into anatase–rutile mixed phase at 100 W. The thickness, roughness, and mass density of the thin films were measured using X‐ray reflectivity. It was observed that for Ts films, the roughness and mass density increased with higher sputter power. Field emission scanning electron microscopy and atomic force microscopy also corroborated this surface roughness result. It was observed from X‐ray photoelectron spectroscopy that the core levels of Ti‐2p3/2 and O‐1s and their corresponding binding energies indicated that only one of the Ti oxidation states, i.e., Ti4+, existed in the films. This work provides insight about the growth of TiO2−x thin films influenced by Ts deposition and different sputter power.

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Section: Introductionmentioning

confidence: 67%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Jana¹,

Debnath

Bahadur

et al. 2021

Surface & Interface Analysis

View full text Add to dashboard Cite

show abstract

“…O 2 /Ar mixture plasma was used as the reactive gas and sputtering gas, respectively. An RF power of 585 V functioning at 40 kHz and 18 A was used to excite the plasma. , The thickness of the TiO 2 thin film was evaluated by a profilometer (Veeco, Dektak 150). The resulting thin film with a thickness of 800 nm was ultimately calcined at 400 °C for 2 h, with a heating rate of 5 °C min –1 .…”

Section: Experimental Sectionmentioning

confidence: 99%

Visualizing the Interfacial Charge Transfer between Photoactive Microcystis aeruginosa and Hydrogenated TiO₂

Mei

et al. 2020

Environ. Sci. Technol.

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Exploring photoactive biotic–abiotic conjugations is of great importance for a variety of applications, but it remains difficult to probe the interfacial transfer of photoinduced charge carriers. In this work, Kelvin probe force microscopy, together with fluorescence imaging technique, were used to visually observe the spatial distribution and interfacial behavior of photocarriers in Microcystis aeruginosa/TiO2 hybrids. Experimental investigations suggested that photosynthetic microalgae cells were prone to trap photoholes from TiO2 photocatalysts. Oxygen vacancy defects in semiconductor exhibited significant impact on the charge migration, as the surface photovoltage of hydrogenated TiO2/microalgae hybrid was much higher than the pristine system. Profiting from the bioenhanced charge separation, biotic–abiotic architecture presented remarkably increased activity for photocatalytic inactivation of microalgae microorganisms. This work not only highlights the visual techniques for understanding the charge transfer around biotic–abiotic interface, but also provides a bioenhanced conjugation for the photocatalytic elimination of microorganisms in water treatment applications.

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Photoelectrocatalytic H2 evolution enhancement over CuO-decorated TiO2 nanocatalysts and promoting E. coli degradation

Srevarit

Moonmangmee

Phapugrangkul

et al. 2021

Journal of Alloys and Compounds

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A simple route to prepare anatase TiO2 film onto polyimide substrate by DC pulsed magnetron sputtering

Cited by 9 publications

References 28 publications

Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Visualizing the Interfacial Charge Transfer between Photoactive Microcystis aeruginosa and Hydrogenated TiO₂

Photoelectrocatalytic H2 evolution enhancement over CuO-decorated TiO2 nanocatalysts and promoting E. coli degradation

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A simple route to prepare anatase TiO2 film onto polyimide substrate by DC pulsed magnetron sputtering

Cited by 9 publications

References 28 publications

Structural properties and surface oxidation states of sputter‐deposited TiO2−x thin films

Structural properties and surface oxidation states of sputter‐deposited TiO2−x thin films

Visualizing the Interfacial Charge Transfer between Photoactive Microcystis aeruginosa and Hydrogenated TiO2

Photoelectrocatalytic H2 evolution enhancement over CuO-decorated TiO2 nanocatalysts and promoting E. coli degradation

Contact Info

Product

Resources

About

Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Structural properties and surface oxidation states of sputter‐deposited TiO_2−x thin films

Visualizing the Interfacial Charge Transfer between Photoactive Microcystis aeruginosa and Hydrogenated TiO₂