2013
DOI: 10.1002/adma.201303199
|View full text |Cite
|
Sign up to set email alerts
|

A Simple Method for Cleaning Graphene Surfaces with an Electrostatic Force

Abstract: A facile method involving electrostatic forces is used to clean graphene surfaces that have been prepared through chemical vapor deposition (CVD). In this electrostatic‐force cleaning (EFC) method, extremely fine cloth fibers are rubbed against CVD‐grown graphene, in order to remove residual poly(methyl methacrylate) (PMMA), known as "PMMA‐G," without damaging the graphene surface.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
13
0

Year Published

2014
2014
2021
2021

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 27 publications
(14 citation statements)
references
References 40 publications
1
13
0
Order By: Relevance
“…S3 ). The G and 2D bands of GF were observed at 1580 and 2670 cm −1 , respectively 20 . Upon coupling of DdIC chromophore to GF, the G and 2D bands in GFPC 1 shifted to 1569 and 2686 cm −1 , respectively.…”
Section: Resultsmentioning
confidence: 96%
“…S3 ). The G and 2D bands of GF were observed at 1580 and 2670 cm −1 , respectively 20 . Upon coupling of DdIC chromophore to GF, the G and 2D bands in GFPC 1 shifted to 1569 and 2686 cm −1 , respectively.…”
Section: Resultsmentioning
confidence: 96%
“…The need to avoid aggressive post-processing cleaning methods has motivated the search for alternative graphene surface cleaning methods. We recently showed that electrostatic force assisted cleaning was an efficient approach for minimizing the PMMA residues of transferred CVD, providing a first step towards residue-free processing of large scale graphene films [21]. One can therefore consider that several approaches to ensure the condition (1) are already proposed in the literature.…”
Section: Introductionmentioning
confidence: 99%
“…Surface contamination of CVD‐derived graphene films has three main origins: intrinsic contamination that occurs during the CVD growth process (Note S1, Supporting Information), polymer residues introduced by transfer processes from the growth substrate to the target substrate, and airborne contaminants . Many attempts have been made to remove surface contaminants from graphene via annealing, plasma treatment, and mechanical cleaning, which have been proven to be effective. However, only emphasizing the elimination of transfer‐related contamination, these postgrowth routines cannot thoroughly solve the issue of surface contamination.…”
mentioning
confidence: 99%