A simple and compact synchrotron radiation x-ray exposure system in a vacuum for ultrafine pattern fabrication

Horiuchi, Toshiyuki; Deguchi, K.; Ishiyama, Toshihiko; Oda, Masanobu

doi:10.1063/1.1146520

Review of Scientific Instruments

1995

DOI: 10.1063/1.1146520

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A simple and compact synchrotron radiation x-ray exposure system in a vacuum for ultrafine pattern fabrication

Toshiyuki Horiuchi

K. Deguchi

Toshihiko Ishiyama

et al.

Abstract: Fabrication of sub30 nm masks for xray nanolithography J. Vac. Sci. Technol. B 13, 3066 (1995); 10.1116/1.588323Study of large area high density magnetic dot arrays fabricated using synchrotron radiation based xray lithography J.

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A simple and compact synchrotron radiation x-ray exposure system in a vacuum for ultrafine pattern fabrication

Abstract: Fabrication of sub30 nm masks for xray nanolithography J. Vac. Sci. Technol. B 13, 3066 (1995); 10.1116/1.588323Study of large area high density magnetic dot arrays fabricated using synchrotron radiation based xray lithography J.

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References 21 publications

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